N-t-butoxycarbonyl-2-adamantylamine | 733037-96-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N-t-butoxycarbonyl-2-adamantylamine
• 英文别名: tert-butyl N-(2-adamantyl)carbamate
• CAS: 733037-96-2
• 化学式: C₁₅H₂₅NO₂
• 分子量: 251.369
• InChiKey: GBKBQCUQXWKJQO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  38.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER
  申请人：ASANO Yuusuke

  公开号：US20120156612A1

  公开（公告）日：2012-06-21

  A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R 1 represents a methyl group or the like, R 2 represents a hydrocarbon group that forms a cyclic structure, R 3 represents a fluorine atom or the like, R 4 represents a carbon atom, and n 1 is an integer from 1 to 7.

  一种辐射敏感树脂组合物包括第一聚合物，其中包括具有酸敏感基团的重复单元，在酸敏感基团解离后变为碱溶解性，并且包括辐射敏感酸发生剂。酸敏感基团具有通式（1）所示的结构。R1代表甲基基团或类似物，R2代表形成环状结构的碳氢基团，R3代表氟原子或类似物，R4代表碳原子，n1为1至7之间的整数。
• RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：MARUYAMA Ken

  公开号：US20120237876A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R 1 to R 3 independently represents a hydroxyl group, or the like. At least one of R 1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R 7 and R 11 independently represents a hydrogen atom, or the like. Each of R 8 to R 10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.

  一种辐射敏感树脂组合物包括溶剂和聚合物。该聚合物包括由式(I)表示的重复单元，由式(II)表示的重复单元，或两者兼有。R1至R3中的每一个独立地表示一个羟基或类似物。其中至少一个R1表示具有两个或更多杂原子的基团。l是从1到5的整数。m和n中的每一个独立地是从0到5的整数。R7和R11中的每一个独立地表示氢原子或类似物。R8到R10中的每一个独立地表示氢原子或类似物。A表示—O—或类似物。D表示取代或未取代的亚甲基基团或类似物。
• RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN
  申请人：Matsumura Nobuji

  公开号：US20090280433A1

  公开（公告）日：2009-11-12

  A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

  一种辐射敏感组合物包含（A）低分子量化合物，其具有一个或多个酸解离基团，该基团在酸作用下分解，以增强其在碱性显影液中的溶解性，并且每个分子具有一个或多个辐射敏感酸生成基团，该基团在施加活性射线或辐射时产生酸，并且其聚苯乙烯还原平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000，并且（B）溶剂。
• RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130288179A1

  公开（公告）日：2013-10-31

  A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R 1 and R 4 each independently represent a hydrogen atom, or the like. R 2 and R 3 each independently represent a hydrogen atom or the like. X 1 and X 2 each independently represent a hydrogen atom, or the like, or X 1 and X 2 taken together represent —S—, —O—, —SO 2 —, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X 1 , X 2 and A is substituted by —Y—SO 3 − M + . Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M + represents a monovalent onium cation. In the case where —Y—SO 3 − M + is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M + s are each identical or different.

  一种辐射敏感的树脂组合物，包括由式（1）表示的化合物和包括具有酸敏感基团的结构单元的聚合物。其中，R1和R4各自独立地表示氢原子等。R2和R3各自独立地表示氢原子等。X1和X2各自独立地表示氢原子等，或X1和X2一起表示-S-、-O-、-SO2-等。A表示乙二酰基基团，其中X1、X2和A中包含的至少一个氢原子被-Y-SO3-M+取代。Y表示具有1到10个碳原子的脂肪二基基团等。M+表示一价的离子型阳离子。在-Y-SO3-M+存在多个的情况下，多个Y可以相同或不同，多个M+可以相同或不同。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20140186771A1

  公开（公告）日：2014-07-03

  A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R 1 is a hydrogen atom, a fluorine atom, or the like. R 2 is a hydrogen atom or a monovalent hydrocarbon group. R 3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 6 is a monovalent chain hydrocarbon group. R 6 is bonded to R 3 to form a first alicyclic structure, or R 6 is bonded to R 5 to form a second alicyclic structure. At least one hydrogen atom of R 2 , R 3 , or R 4 is optionally substituted with a fluorine atom.

  一种辐射敏感树脂组合物，包括聚合物，该聚合物包括由式（1）表示的结构单元和酸发生剂。其中R1为氢原子、氟原子或类似物。R2为氢原子或一价碳氢基团。R3为氢原子、一价链状碳氢基团或类似物。R4为氢原子、一价链状碳氢基团或类似物。R5为氢原子、一价链状碳氢基团或类似物。R6为一价链状碳氢基团。R6与R3结合形成第一脂环结构，或R6与R5结合形成第二脂环结构。R2、R3或R4中的至少一个氢原子可以被氟原子取代。