5-cyclohexylpentane-1-thiol | 4361-15-3

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醇
• 英文名称: 5-cyclohexylpentane-1-thiol
• 英文别名: (5-Mercapto-pentyl)-cyclohexan；5-Cyclohexyl-pentylmercaptan；5-Cyclohexyl-pentan-1-thiol
• CAS: 4361-15-3
• 化学式: C₁₁H₂₂S
• 分子量: 186.362
• InChiKey: LLHRBGJOELAOLE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  12
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 sodium hydroxide 作用下， 生成 5-cyclohexylpentane-1-thiol
  参考文献：
  名称：

  血吸虫病中的有机硫-锑。

  摘要：

  DOI：

  10.1021/ja01187a041

文献信息

• [EN] NOVEL COMPOUNDS, THEIR PREPARATION AND USE<br/>[FR] NOUVEAUX COMPOSES, LEUR PREPARATION ET LEUR UTILISATION
  申请人：NOVO NORDISK AS

  公开号：WO2005105725A1

  公开（公告）日：2005-11-10

  Novel compounds of the general formula (I), in which the variables are as defined in claim 1, the use of these compounds as pharmaceutical compositions, pharmaceutical compositions comprising the compounds and methods of treatment employing these compounds and compositions. The present compounds are useful in the treatment and/or prevention of conditions mediated by Peroxisome Proliferator-Activated Receptors (PPAR), in particular the PPARδ subtype, namely, type 1 diabetes, type 2 diabetes, dyslipidaemia, syndrome X (including the metabolic syndrome, i.e. impaired glucose tolerance, insulin resistance, hypertriglyceridaemia and/or obesity), cardiovascular diseases (including atherosclerosis) and hypercholesterolaemia.

  通用公式（I）的新化合物，其中变量如权利要求1中定义的那样，这些化合物作为药物组成物的用途，包含这些化合物的药物组成物以及使用这些化合物和组成物的治疗方法。这些化合物在治疗和/或预防由过氧化物酶体增殖物激活受体（PPAR）介导的疾病中有用，特别是PPARδ亚型，即1型糖尿病，2型糖尿病，血脂异常，X综合征（包括代谢综合征，即糖耐量受损，胰岛素抵抗，高三酰甘油血症和/或肥胖症），心血管疾病（包括动脉粥样硬化）和高胆固醇血症的条件。
• Novel Compounds, Their Preparations And Use
  申请人：Havranek Miroslav

  公开号：US20080114036A1

  公开（公告）日：2008-05-15

  Novel compounds of the general formula (I), in which the variables are as defined in claim 1 , the use of these compounds as pharmaceutical compositions, pharmaceutical compositions comprising the compounds and methods of treatment employing these compounds and compositions. The present compounds are useful in the treatment and/or prevention of conditions mediated by Peroxisome Proliferator-Activated Receptors (PPAR), in particular the PPARδ subtype, namely, type 1 diabetes, type 2 diabetes, dyslipidaemia, syndrome X (including the metabolic syndrome, i.e. impaired glucose tolerance, insulin resistance, hyper triglyceridaemia and/or obesity), cardiovascular diseases (including atherosclerosis) and hypercholesterolaemia.

  通式（I）的新化合物，其中变量如权利要求1所定义的，这些化合物的用途为制备药物组合物、包括这些化合物的药物组合物和使用这些化合物和组合物的治疗方法。这些化合物可用于治疗和/或预防由过氧化物酶体增殖物激活受体（PPAR）介导的疾病，特别是PPARδ亚型，即1型糖尿病、2型糖尿病、血脂异常、X综合症（包括代谢综合症，即糖耐量受损、胰岛素抵抗、高甘油三酯血症和/或肥胖症）、心血管疾病（包括动脉粥样硬化）和高胆固醇血症。
• Novel Compounds, Their Preparations and Use
  申请人：Havranek Miroslav

  公开号：US20100210653A1

  公开（公告）日：2010-08-19

  Novel compounds of the general formula (I), the use of these compounds as pharmaceutical compositions, pharmaceutical compositions comprising the compounds and methods of treatment employing these compounds and compositions. The present compounds may be useful in the treatment and/or prevention of conditions mediated by Peroxisome proliferator-activated receptors (PPAR), in particular the PPARδ suptype.

  本发明涉及一般式(I)的新型化合物，这些化合物的用途是作为药物组合物，包括这些化合物的药物组合物以及使用这些化合物和组合物的治疗方法。本发明的化合物可以用于治疗和/或预防由过氧化物酶体增殖物激活受体（PPAR）介导的疾病，特别是PPARδ亚型。
• COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3770209A1

  公开（公告）日：2021-01-27

  The present invention provides a composition for forming a silicon-containing resist underlayer film that can form resist patterns excellent in LWR and CDU, and a patterning process using the composition. A composition for forming a silicon-containing resist underlayer film including: a thermosetting silicon-containing material containing any one or more of a partial structure shown by the general formula (Sx-1), (Sx-2), and (Sx-3); and a compound shown by the general formula (P-0), where R1 represents an organic group that has or generates a silanol group, a hydroxy group, or a carboxy group; R2 and R3 are each independently the same as R1 or each represent a hydrogen atom or a monovalent substituent having 1 to 30 carbon atoms; R100 represents a divalent organic group substituted with a fluorine atom; R101 and R102 each independently represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; R103 represents a divalent hydrocarbon group having 1 to 20 carbon atoms; and L104 represents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms.

  本发明提供了一种用于形成含硅抗蚀剂底层薄膜的组合物，该组合物可形成在低温再生和高温分解中性能优异的抗蚀剂图案，还提供了一种使用该组合物的图案化工艺。一种用于形成含硅抗蚀剂底层薄膜的组合物，包括含有通式（Sx-1）、（Sx-2）和（Sx-3）所示部分结构中的任意一种或多种的热固性含硅材料；以及通式（P-0）所示化合物，其中 R1 代表具有或产生硅醇基、羟基或羧基的有机基团；R2 和 R3 各自独立地与 R1 相同，或各自代表氢原子或具有 1 至 30 个碳原子的一价取代基；R100 代表被氟原子取代的二价有机基团；R101 和 R102 各自独立地代表具有 1 至 20 个碳原子的一价烃基团；R103 代表具有 1 至 20 个碳原子的二价烃基团；以及 L104 代表单键或具有 1 至 20 个碳原子的二价烃基团。
• NOVEL COMPOUNDS, THEIR PREPARATION AND USE
  申请人：NOVO NORDISK A/S

  公开号：EP1745002A1

  公开（公告）日：2007-01-24