申请人:AQAD Emad
公开号:US20120129108A1
公开(公告)日:2012-05-24
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
本发明涉及新的光酸发生剂化合物和包含这些化合物的光刻胶组成物。特别地,本发明涉及包含可被碱剪断基团的光酸发生剂化合物。