申请人:Rohm and Haas Electronic Materials LLC
公开号:EP2452932A2
公开(公告)日:2012-05-16
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
本发明涉及新的光酸发生剂化合物和包含这种化合物的光刻胶组合物。具体而言,本发明涉及包含可基裂解基团的光酸发生剂化合物。