Antireflection film, polarizing plate and image display device
申请人:Takada Katsuyuki
公开号:US20110026126A1
公开(公告)日:2011-02-03
An antireflection film includes a support and a low refractive index layer formed from a composition for low refractive index layer containing (A) a polyfunctional fluorine-containing monomer having a polymerizable group and (B) a hydrophobilized conductive polymer composition containing a π-conjugated system conductive polymer and an anion group-containing polymer dopant, and a common logarithm log(SR) of a surface resistivity SR (Ω/sq) of a surface of the antireflection film on a side at which the low refractive index layer is provided is not more than 13.0.
PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION
申请人:AKUTAGAWA Nobuyuki
公开号:US20120207990A1
公开(公告)日:2012-08-16
A production method of an antireflection film comprises, in order, a step of applying a coating composition obtained by mixing the following components (A) to (D) on a base material to form a coating film, a step of drying the coating film to volatilize the solvent therefrom, and a step of curing the coating film to form a cured layer, wherein a multilayer structure having different refractive indexes is formed from the coating composition: (A) a compound having at least one structure selected from a fluorine-containing hydrocarbon structure and a polysiloxane structure and at least one isocyanate group; (B) an inorganic fine particle; (C) a curable binder containing no fluorine atom in the molecule; and (D) a solvent; provided that the mass ratio of [component (A)+component (B)]/[component (C)] is from 1/199 to 60/40.
METHOD FOR PRODUCING ANTIREFLECTION FILM, ANTIREFLECTION FILM, AND COATING COMPOSITION
申请人:AKUTAGAWA Nobuyuki
公开号:US20120270021A1
公开(公告)日:2012-10-25
The method for producing an antireflection film is provided. The method includes, a step of coating a coating composition including the following components (A) to (D) on a base material to form a coating film, a step of volatilizing the solvent from the coating film for drying the coating film, and a step of curing the coating film to form a cured layer, in which a multilayer structure having different refractive indices from the coating composition is formed: (A) a fluorine-containing polymer with a specific structure, having a polyalkylene oxide group in the molecule, (B) non-surface-modified inorganic fine particles, or inorganic fine particles that are surface-treated with a silane coupling agent having a molecular weight of 600 or less, (C) a curable binder having no fluorine atom in the molecule, and (D) a solvent, provided that the mass ratio of [component (A)+component (B)]/[component (C)] is from 1/199 to 60/40.
METHOD OF MANUFACTURING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND COATING COMPOSITION
申请人:FUJIFILM Corporation
公开号:US20130084442A1
公开(公告)日:2013-04-04
A method of manufacturing an anti-reflection film, the method forming a multi-layer structure with different refractive indices from a coating composition in which the following (A) to (F) components are mixed. (A) Fluorine-containing polymer including a fluorine-containing hydrocarbon structure and a constituent unit derived from a compound having at least one group selected from a polyalkylene oxide group and a basic functional group, (B) Low refractive index inorganic fine particles which are not surface-modified or low refractive index inorganic fine particles which are surface-treated with a silane coupling agent having the molecular weight of 600 or less, (C) A curable binder containing no fluorine atoms in the molecule, (D) A solvent, (E) A polyfunctional fluorine-containing curable compound, and (F) High refractive index inorganic fine particles treated with a specific surface modifying agent.
PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR RESIN FILM, PRODUCTION METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT, AND FLUORINE-CONTAINING POLYMER
申请人:ASAHI GLASS COMPANY, LIMITED
公开号:US20170322488A1
公开(公告)日:2017-11-09
To provide a photosensitive resin composition containing a crosslinkable fluororesin which hardly damages a substrate of e.g. an organic semiconductor when a resin film is formed, and a resin film using it, an organic semiconductor device and its production process, and a fluororesin suitable for the photosensitive resin composition.
A photosensitive resin composition comprising a fluororesin having a polymerizable carbon-carbon double bond and having a fluorine atom content of at least 47 mass %, a crosslinking agent having a polymerizable carbon-carbon double bond (excluding the fluororesin), a photoinitiator and a non-aromatic fluorinated solvent.