2-Chloro-acrylic acid 2-hydroxy-propyl ester | 69618-41-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-Chloro-acrylic acid 2-hydroxy-propyl ester
• 英文别名: 2-Hydroxypropyl 2-chloroprop-2-enoate
• CAS: 69618-41-3
• 化学式: C₆H₉ClO₃
• 分子量: 164.589
• InChiKey: IWRFOAPMWBZCBY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：KAWABATA Takeshi

  公开号：US20120082939A1

  公开（公告）日：2012-04-05

  An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.

  提供了一种活性光线敏感或放射线敏感的树脂组合物，其在很大程度上同时满足高灵敏度、高分辨率、良好的图案配置和良好的线边粗糙度，同时在曝光期间具有足够好的排气性能，以及使用该组合物形成的活性光线敏感或放射线敏感薄膜和形成图案的方法。本发明的活性光线敏感或放射线敏感的树脂组合物包括含有重复单元（A）的树脂（P），该重复单元通过活性光线或放射线辐射分解生成酸，并且含有主要或次要羟基的重复单元（C）。
• Vinyl ethers and fluorine-containing copolymers prepared therefrom
  申请人：DAIKIN INDUSTRIES, LIMITED

  公开号：EP0281991A2

  公开（公告）日：1988-09-14

  Vinyl ethers having a carboxyl group in a form of salt are stable and is usable as materials for fluorine-containing copolymers. The vinyl ethers can provide sable monomer compositions by mixing with vinyl ethers having a free carboxyl group when the former vinyl ethers are present in an amount of not less than 1 % by mole of the latter vinyl ethers. The fluorine-containing copolymer prepared by copolymerizing fluoroolefins with the vinyl ethers are useful as aqueous coatings particularly electro dip coatings.

  具有羧基盐形式的乙烯基醚是稳定的，可用作含氟共聚物的材料。 如果前一种乙烯基醚的含量不低于后一种乙烯基醚的 1%（按摩尔计），则与具有游离羧基的乙烯基醚混合，乙烯基醚可提供可塑单体组合物。 通过氟烯烃与乙烯基醚共聚制备的含氟共聚物可用作水性涂料，特别是电浸渍涂料。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE
  申请人：Toray Industries, Inc.

  公开号：EP3267254A1

  公开（公告）日：2018-01-10

  Provided is a photosensitive resin composition containing: one or more kinds of alkali-soluble resins selected from a polyimide, a polybenzoxazole, a polyimide precursor, a polybenzoxazole precursor, and a copolymer formed of two or more polymers selected from the preceding substances; and a photosensitizer. The photosensitive resin composition further contains a compound represented by general formula (1). Even when a cured film is fired at low temperature, the photosensitive resin composition exhibits superior adhesion properties with metallic materials, particularly copper, and also exhibits high chemical resistance.

  本发明提供了一种光敏树脂组合物，其中含有：一种或多种选自聚酰亚胺、聚苯并恶唑、聚酰亚胺前体、聚苯并恶唑前体和两种或多种选自前述物质的聚合物形成的共聚物的碱溶性树脂；以及一种光敏剂。光敏树脂组合物还含有通式（1）所代表的化合物。即使在低温下烧制固化薄膜，光敏树脂组合物也能与金属材料，特别是铜，表现出优异的粘合性能，并具有很高的耐化学性。
• HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT
  申请人：Toray Industries, Inc.

  公开号：EP3284771A1

  公开（公告）日：2018-02-21

  The purpose of the present invention is to provide a heat-resistant resin composition having excellent stepped embedding properties on a support substrate. In order to achieve the aforementioned purpose, the present invention is configured as described below. Specifically, the present invention is a heat-resistant resin composition containing: as a resin (A) one or more types of resin selected from the group consisting of a polyimide precursor, and a polybenzoxazole precursor; as an organic solvent (B) an organic solvent having a boiling point of 210°C to 260°C at atmospheric pressure; and as an organic solvent (C) an organic solvent having a boiling point of 100°C to less than 210°C at atmospheric pressure; the content of the organic solvent (B) being 5% by mass to 70% by mass with respect to the entire amount of the organic solvents, and the content of the organic solvent (C) being 30% by mass to 95% by mass with respect to the entire amount of the organic solvents.

  本发明的目的是提供一种耐热树脂组合物，该组合物在支撑基材上具有优异的阶梯嵌入特性。为了实现上述目的，本发明的结构如下所述。具体地说，本发明是一种耐热树脂组合物，其中含有作为树脂（A）从聚酰亚胺前体和聚苯并恶唑前体组成的组中选出的一种或多种树脂； 作为有机溶剂（B）在常压下沸点为 210℃至 260℃的有机溶剂；以及 作为有机溶剂（C）在常压下沸点为 100℃至 210℃以下的有机溶剂；有机溶剂(B)的含量为有机溶剂总量的 5%至 70%，有机溶剂(C)的含量为有机溶剂总量的 30%至 95%。
• Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device
  申请人：TORAY INDUSTRIES, INC.

  公开号：US10365559B2

  公开（公告）日：2019-07-30

  Provided is a photosensitive resin composition containing: one or more kinds of alkali-soluble resins selected from a polyimide, a polybenzoxazole, a polyimide precursor, a polybenzoxazole precursor, and a copolymer formed of two or more polymers selected from the preceding substances; and a photosensitizer. The photosensitive resin composition further contains a compound represented by general formula (1). Even when a cured film is fired at low temperature, the photosensitive resin composition exhibits superior adhesion properties with metallic materials, particularly copper, and also exhibits high chemical resistance.

  本发明提供了一种光敏树脂组合物，其中含有：一种或多种选自聚酰亚胺、聚苯并恶唑、聚酰亚胺前体、聚苯并恶唑前体和两种或多种选自前述物质的聚合物形成的共聚物的碱溶性树脂；以及一种光敏剂。光敏树脂组合物还含有通式（1）所代表的化合物。即使在低温下烧制固化薄膜，光敏树脂组合物也能与金属材料，特别是铜，表现出优异的粘合性能，并具有很高的耐化学性。