(E)-3-(phenylsulfonyl)-1,3-pentadiene | 97072-50-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (E)-3-(phenylsulfonyl)-1,3-pentadiene
• 英文别名: [(3E)-penta-1,3-dien-3-yl]sulfonylbenzene
• CAS: 97072-50-9
• 化学式: C₁₁H₁₂O₂S
• 分子量: 208.281
• InChiKey: WLEGFSKAXAAXQS-ONNFQVAWSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  42.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1,o-Dilithio-allylphenylsulfon 在 二异丙氧基二氯化钛 作用下， 以 四氢呋喃 为溶剂， 生成 (E)-3-(phenylsulfonyl)-1,3-pentadiene
  参考文献：
  名称：

  Vollhardt, Juergen; Gais, Hans-Joachim; Lukas, Karl L., Angewandte Chemie, 1985, vol. 97, # 7, p. 607 - 609

  摘要：

  DOI：

文献信息

• Cycloaddition of (phenylsulfonyl)-1,2-propadienes with diazomethane. Novel rearrangement reactions of the resulting cycloadducts
  作者：Albert Padwa、Michelle A. Filipkowski、Donald N. Kline、S. Shaun Murphree、Philip E. Yeske

  DOI：10.1021/jo00060a021

  日期：1993.4

  The cycloaddition reactions of several phenylsulfonyl-substituted allenes with diazomethane have been investigated. The major products formed were identified as 3-(phenylsulfonyl)-4-methylene-2-pyrazolines. These pyrazolines engage in a variety of mechanistically interesting transformations, ranging from base-catalyzed rearrangements to addition of Grignard reagents. The dipolar cycloadduct derived from the reaction of diazomethane with 3-(phenylsulfonyl)-1,2-butadiene undergoes a 1,3-phenylsulfonyl shift upon irradiation to give 3-methyl-4-[(phenylsulfonyl)methyl]pyrazole. The cycloadduct derived from there action of 2,3-bis(phenylsulfonyl)-1-propene with diazomethane readily loses nitrogen upon photolysis to give 1-[(phenylsulfonyl)methyl]-1-(phenylsulfonyl)cyclopropane. This cyclopropane affords a variety of novel rearranged structures when treated with several different bases. The products obtained can be rationalized in terms of a base-catalyzed rearrangement of the above cyclopropane to a-methyl(phenylsulfonyl)allene which reacts further with the particular base used to produce the observed products.
• VOLLHARDT, J.;GAIS, H. -J.;LUKAS, K. L., ANGEW. CHEM., 1985, 97, N 7, 607-609
  作者：VOLLHARDT, J.、GAIS, H. -J.、LUKAS, K. L.

  DOI：——

  日期：——
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PHOTOSENSITIVE RESIN COATING, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180224743A1

  公开（公告）日：2018-08-09

  A photosensitive resin composition comprising (A) a silicone-modified polybenzoxazole resin and (B) a photoacid generator which is decomposed to generate an acid upon exposure to radiation of 190-500 nm is coated onto a substrate to form a thick coating, which is exposed to radiation, baked, and developed to form a pattern. The resin coating is capable of forming a fine pattern and has improved crack resistance and other film properties, and reliability.