Basic compound, chemically amplified resist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP2463714A1
公开(公告)日:2012-06-13
A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.