Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
R1 is H or C1-6 alkyl, R2 is an unsubstituted or halo-substituted acyl or alkoxycarbonyl group of 1-15 carbon atoms, R3 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.
式(1)的
酯类化合物可作为单体形成基底
树脂,用于微图案光刻的
化学放大抗蚀剂组合物。
R1 是 H 或 C1-6 烷基,R2 是未取代或卤代取代的酰基或 1-15 个碳原子的烷氧羰基,R3 是易酸基团,k 是 0 或 1,m 是 0 至 5 的整数。