Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
1
R
1
is H or C
1-6
alkyl, R
2
is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.
式(1)的酯化合物可用作单体,形成基础
树脂,用于
化学增强型抗蚀剂组合物,适用于微细图案制造光刻。其中,1R1为H或C1-6烷基,R2为酸敏感基团,k为0或1,m为0至5的整数。