Methyl-β-acetoxyethoxyacetat | 58349-38-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Methyl-β-acetoxyethoxyacetat
• 英文别名: Methyl 2-(2-acetyloxyethoxy)acetate
• CAS: 58349-38-5
• 化学式: C₇H₁₂O₅
• 分子量: 176.169
• InChiKey: CFMKIWUHYZIXPC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  12
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170247323A1

  公开（公告）日：2017-08-31

  A salt having a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocycilic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.

  一种盐，其具有由公式（aa）表示的基团：其中Xa和Xb独立地代表一个氧原子或一个硫原子，环W代表一个具有酯键或硫酯键的C3-C36杂环环，该杂环环还可以进一步具有一个氧原子、一个硫原子、一个羰基或一个磺酰基，其中每个都已被一个亚甲基取代，该杂环环还可以具有一个羟基、一个氰基、一个羧基、一个C1-C12烷基、一个C1-C12烷氧基、一个C2-C13烷氧羰基、一个C2-C13酰基、一个C2-C13酰氧基、一个C3-C12脂环烃基、一个C6-C10芳香烃基或任何组合，其中每个都已被氢原子取代，*表示一个结合位置。
• RESIN AND RESIST COMPOSITION
  申请人：Ichikawa Koji

  公开号：US20100323296A1

  公开（公告）日：2010-12-23

  A resin comprises a structural unit derived from a compound represented by the formula (aa) wherein T represents a C 4 to C 36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C 1 to C 12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C 1 to C 12 alkoxyl group, a C 6 to C 12 aryl group, a C 7 to C 12 aralkyl group, a glycidyloxy group, a C 2 to C 4 acyl group, an alkoxycarbonyl group, an alkanoyloxyalkyl group or a cyano group, and the —CH 2 — contained in the alicyclic hydrocarbon group is replaced by at least one —SO 2 — and furthermore may be replaced by —CO—, —O—, —S—, —SO 2 — or —N(R c )—; R c represents a hydrogen atom or a C 1 to C 6 alkyl group; R 1 represents a hydrogen atom, a halogen atom, or a C 1 to C 6 alkyl group that may optionally has halogen atoms; and Z 1 represents an optionally substituted C 1 to C 17 saturated hydrocarbon group, and the —CH 2 — contained in the saturated hydrocarbon group may be replaced by —CO—, —O—, —S— or —N(R c )—.
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110065040A1

  公开（公告）日：2011-03-17

  The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R 1 represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., R 2 and R 3 each independently represent a hydrogen atom, etc., R 4 , R 5 and R 6 each independently represent a hydrogen atom, etc., A 1 represents a single bond or a C1-C2 alkylene group in which one or more —CH 2 — can be replaced by —O—.
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：YOSHIDA Isao

  公开号：US20120052440A1

  公开（公告）日：2012-03-01

  The present invention provides a salt represented by the formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 and L 2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 and ring W 2 independently each represent a C3-C36 aliphatic ring, R 2 is independently in each occurrence a C1-C6 alkyl group, R 4 is independently in each occurrence a C1-C6 alkyl group, R 3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z + represents an organic counter ion.