1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8-Hexadecafluoro-1-octanesulfonic acid | 134615-57-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8-Hexadecafluoro-1-octanesulfonic acid
• 英文别名: 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8-hexadecafluorooctane-1-sulfonic acid
• CAS: 134615-57-9
• 化学式: C₈H₂F₁₆O₃S
• 分子量: 482.14
• InChiKey: DHYPEWXXSPZJNA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  28
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  19

文献信息

• ADSORBENT FOR ORGANIC FLUORO-COMPOUND COMPRISING CYCLODEXTRIN-SUPPORTED POLYMER
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：US20150314266A1

  公开（公告）日：2015-11-05

  The present invention is to provide a material that is capable of selectively adsorbing organic fluoro-compounds such as perfluorooctane sulfonic acid, allows the adsorbed organic fluoro-compounds to be recovered, and is reusable as an adsorbent, specifically to provide a polymer in which cyclodextrin is supported on the surface of a water-insoluble polymer, and an adsorbent containing the same, and a method of use of the same as a selective adsorbent of, in particular, an organic fluoro-compound.

  本发明旨在提供一种材料，能够有选择性地吸附有机氟化合物，如全氟辛烷磺酸，允许吸附的有机氟化合物得以回收，并可重复使用作为吸附剂，具体而言，提供一种在水不溶性聚合物表面支持环糊精的聚合物，以及含有该聚合物的吸附剂，以及将其用作有机氟化合物的选择性吸附剂的方法。
• Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method
  申请人：——

  公开号：US20030207201A1

  公开（公告）日：2003-11-06

  The invention provides a high-resolution resist material comprising an acid generator that has high sensitivity and high resolution with respect to high-energy rays of 300 nm or less, has small line-edge roughness, and is superior in heat stability and in shelf stability, and provides a pattern forming method that uses this resist material. The invention further provides a chemically amplified positive resist material comprising a base resin, an acid generator and a solvent in which the acid generator generates an alkylimidic acid containing a fluorine group, and provides a pattern forming method comprising a step of applying the resist material to the substrate, a step of performing exposure to a high-energy ray of a wavelength of 300 nm or less through a photomask following heat treatment, and a step of performing development by a developing solution following heat treatment.

  本发明提供了一种高分辨率的抗蚀材料，包括具有高灵敏度和高分辨率，对300纳米或以下的高能射线具有小线边粗糙度，具有优异的热稳定性和货架稳定性的酸发生剂，并提供使用该抗蚀材料的图案形成方法。本发明还提供了一种化学增强型正向抗蚀材料，包括基础树脂、酸发生剂和溶剂，其中酸发生剂生成含有氟基的烷基亚胺酸，并提供一种图案形成方法，包括将抗蚀材料涂布到基板上的步骤，经过热处理后通过光掩膜对波长为300纳米或以下的高能射线进行曝光的步骤，以及经过热处理后通过显影液进行显影的步骤。
• Thiadiazole compounds and use thereof
  申请人：Ihara Hideki

  公开号：US20050215578A1

  公开（公告）日：2005-09-29

  A thiadiazole compound of the formula (A): wherein R 1 represents methyl, C3-C7 alkenyl, C2-C7 alkoxyalkyl, C2-C7 alkylthioalkyl, C4-C7 alkoxyalkoxyalkyl, C4-C7 alkylthioalkoxyalkyl, phenyl C1-C2 alkyl in which phenyl may be substituted, phenyloxy C1-C2 alkyl in which phenyloxy may be substituted, phenyl C2-C3 alkoxyalkyl in which phenyl may be substituted, or the substituent of the formula (B): wherein R represents C1-C3 alkyl, and R 4 represents a hydrogen atom, methyl, ethyl or phenyl which may be substituted; and R 2 represents phenyl C1-C4 alkyl in which phenyl may be substituted, pyridyl C1-C4 alkyl in which pyridyl may be substituted, or pyrimidyl C1-C4 alkyl in which pyrimidyl may be substituted; has an excellent arthropod pests controlling activity.

  式（A）的噻二唑化合物，其中 R1代表甲基，C3-C7烯基，C2-C7烷氧基烷基，C2-C7烷硫基烷基，C4-C7烷氧基烷氧基烷基，C4-C7烷硫基烷氧基烷基，苯基C1-C2烷基，其中苯基可以被取代，苯氧基C1-C2烷基，其中苯氧基可以被取代，苯基C2-C3烷氧基烷基，其中苯基可以被取代，或式（B）的取代基：其中R代表C1-C3烷基，R4代表氢原子，甲基，乙基或苯基，可以被取代；而R2代表苯基C1-C4烷基，其中苯基可以被取代，吡啶基C1-C4烷基，其中吡啶基可以被取代，或嘧啶基C1-C4烷基，其中嘧啶基可以被取代；具有优异的节肢动物害虫控制活性。
• THIADIAZOLE COMPOUNDS AND USE THEREOF
  申请人：Sumitomo Chemical Company, Limited

  公开号：EP1475374A1

  公开（公告）日：2004-11-10

  A thiadiazole compound of the formula (A): wherein R1 represents methyl, C3-C7 alkenyl, C2-C7 alkoxyalkyl, C2-C7 alkylthioalkyl, C4-C7 alkoxyalkoxyalkyl, C4-C7 alkylthioalkoxyalkyl, phenyl C1-C2 alkyl in which phenyl may be substituted, phenyloxy C1-C2 alkyl in which phenyloxy may be substituted, phenyl C2-C3 alkoxyalkyl in which phenyl may be substituted, or the substituent of the formula (B): wherein R3 represents C1-C3 alkyl, and R4 represents a hydrogen atom, methyl, ethyl or phenyl which may be substituted; and R2 represents phenyl C1-C4 alkyl in which phenyl may be substituted, pyridyl C1-C4 alkyl in which pyridyl may be substituted, or pyrimidyl C1-C4 alkyl in which pyrimidyl may be substituted; has an excellent arthropod pests controlling activity.

  一种式(A)的噻二唑化合物： 其中 R1 代表甲基、C3-C7 烯基、C2-C7 烷氧基烷基、C2-C7 硫代烷基、C4-C7 烷氧基烷基、C4-C7 硫代烷氧基烷基、其中苯基可被取代的苯基 C1-C2 烷基、其中苯基氧基可被取代的苯基 C1-C2 烷基、其中苯基可被取代的苯基 C2-C3 烷氧基烷基或式（B）的取代基： 其中 R3 代表 C1-C3 烷基，R4 代表氢原子、甲基、乙基或可被取代的苯基；以及 R2 代表苯基 C1-C4 烷基，其中苯基可被取代，吡啶基 C1-C4 烷基 或嘧啶 C1-C4 烷基，其中嘧啶基可能被取代； 具有极佳的控制节肢动物害虫的活性。
• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。