RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING RUTHENIUM-CONTAINING THIN FILM
申请人:TOSOH CORPORATION
公开号:US20150303063A1
公开(公告)日:2015-10-22
The present invention is to provide a ruthenium complex represented by formula (1a), (2), (3), etc., which is useful for producing a ruthenium-containing thin film both under the conditions using an oxidizing gas as the reaction gas and under the conditions using a reducing gas as the reaction gas:
wherein R
1a
to R
7a
, R
8
, R
9
and R
10
to R
18
represents an alkyl group having a carbon number of 1 to 6, etc., and n represents an integer of 0 to 2.