t-butyl 2-(trifluoromethyl)-bicyclo[2.2.1]hept-5-ene-2-carboxylate | 365568-55-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: t-butyl 2-(trifluoromethyl)-bicyclo[2.2.1]hept-5-ene-2-carboxylate
• 英文别名: 5-t-butoxycarbonyl-5-trifluoromethylbicyclo[2.2.1]-2-heptene；2-trifluoromethylnorbornene-2-carboxylic acid t-butyl ester；5-t-butoxycarbonyl-5-trifluoromethylbicyclo[2.2.1]-2-hepten；2-trifluoromethyl-2-tert-butyloxycarbonyl-5-norbornene；2-(Trifluoromethyl)norborna-5-ene-2-carboxylic acid tert-butyl ester；tert-butyl 2-(trifluoromethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 365568-55-4
• 化学式: C₁₃H₁₇F₃O₂
• 分子量: 262.272
• InChiKey: YPUIODZTIWQAPP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Polymers and photoresists comprising same
  申请人：——

  公开号：US20040248032A1

  公开（公告）日：2004-12-09

  New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO 2 or TiO 2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.

  提供了新的聚合物，其中包含非碳四价物种（Si，Ti，Ge，Zr，Sn），以及包含这些聚合物的可成像光敏组合物。首选聚合物是有机的，例如一个或多个聚合物重复单元包含碳原子。特别优选的是包含SiO2或TiO2重复单元的聚合物，可作为在短波长下成像的光阻树脂组分，例如亚300 nm和亚200 nm。
• Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor
  申请人：Koyama Hiroshi

  公开号：US20060058480A1

  公开（公告）日：2006-03-16

  A polymerizable monomer of the present invention is represented by the following formula (1); R 1 , R 2 and R 3 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group, W is a single bond or a linkage group and n is 0 or 1, where at least one of R 1 , R 2 and R 3 is a fluorine atom or a fluoroalkyl group when n= 1; and the ring in the formula may have a substituent. The polymerizable monomer of the present invention can provide an appropriate hydrophilicity or hydrophilicity and transparency to a photoresist polymer.

  本发明的可聚合单体由以下公式（1）表示；其中，R1、R2和R3分别为氢原子、氟原子、烷基或氟烷基，W为单键或连接基，n为0或1，当n=1时，R1、R2和R3中至少有一个为氟原子或氟烷基；公式中的环可能具有取代基。本发明的可聚合单体能够为光刻胶聚合物提供适当的亲水性或亲疏水性和透明度。
• Process for preparing fluorine-containing norbornene derivative
  申请人：Araki Takayuki

  公开号：US20070129576A1

  公开（公告）日：2007-06-07

  There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F 2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

  提供了一种新型的诺伯烯衍生物，用作F2激光化学扩增型光刻胶的材料，具有优异的透明度和改进的干法蚀刻耐性，并且具有直接连接到诺伯烯骨架的含氟酮基或含氟三级醇基；使用该诺伯烯衍生物作为共聚单体获得的含氟聚合物；以及包括含氟聚合物、光酸发生剂和溶剂的化学扩增型光刻胶组合物。
• POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1398339A1

  公开（公告）日：2004-03-17

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B) .

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有酸可分解基团的树脂、 其中，R1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂肪族基团，R2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物（A）包括聚硅氧烷（A）和光酸发生器（B）。
• Polysiloxane, process for production thereof and radiation-sensitive resin composition
  申请人：——

  公开号：US20040143082A1

  公开（公告）日：2004-07-22

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, 1 wherein R 1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R 2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有可酸解基团的树脂、 1 其中 R 1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂 族基团，R 2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物 (A) 包括聚硅氧烷 (A) 和光酸发生器 (B)