N-Hydroxytetramethylsuccinimid-O-triflat | 41580-59-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N-Hydroxytetramethylsuccinimid-O-triflat
• 英文别名: 3,3,4,4-tetramethyl-1-trifluoromethanesulfonyloxy-pyrrolidine-2,5-dione；(3,3,4,4-Tetramethyl-2,5-dioxopyrrolidin-1-yl) trifluoromethanesulfonate
• CAS: 41580-59-0
• 化学式: C₉H₁₂F₃NO₅S
• 分子量: 303.259
• InChiKey: GPNOSKLZOAGJOC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  8

文献信息

• Polymer and photoresist compositions
  申请人：Shipley Company, L.L.C.

  公开号：US20020173680A1

  公开（公告）日：2002-11-21

  Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.

  本文披露了螺环烯烃聚合物、制备螺环烯烃聚合物的方法、包括螺环烯烃树脂粘合剂的光刻胶组合物，以及利用这种光刻胶组合物形成凸版图像的方法。
• Processes for producing silane monomers and polymers and photoresist compositions comprising same
  申请人：Shipley Company, L.L.C.

  公开号：US20030219676A1

  公开（公告）日：2003-11-27

  The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.

  该发明包括新的含硅单体、含有这种单体的聚合物和含有聚合物的光刻胶。该发明的合成方法包括将乙烯基环烷基酯化合物与反应性硅烷化合物反应以提供单体。
• Process for producing polysiloxanes and photoresist compositions comprising the same
  申请人：Shipley Co. L.L.C.

  公开号：EP1455228A1

  公开（公告）日：2004-09-08

  New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

  本发明提供了合成聚硅氧烷（silsesquioxanes）和包含聚硅氧烷的光致抗蚀剂的新方法。本发明的合成方法包括使用具有多个活性氮基团的聚合模板试剂，特别是二胺试剂。
• Processes for producing polysiloxanes and photoresist compositions comprising same
  申请人：Shipley Company, L.L.C.

  公开号：US20030224286A1

  公开（公告）日：2003-12-04

  New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

  本发明提供了合成聚硅氧烷（silsesquioxanes）和包含聚硅氧烷的光致抗蚀剂的新方法。本发明的合成方法包括使用具有多个活性氮基团的聚合模板试剂，特别是二胺试剂。
• Photoresists containing Si-polymers
  申请人：Shipley Company, L.L.C.

  公开号：US20040209187A1

  公开（公告）日：2004-10-21

  In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin component. In a further aspect, halogenated sulfonamide and thiol compounds and Si-containing polymers comprising such reacted monomers are provided.

  第一方面，本发明提供的硅聚合物具有可控的硅醇（Si-OH）分子与硅原子的比例和/或可控量的碱性水溶性基团。本发明的硅聚合物尤其可用作光阻树脂成分。另一方面，本发明提供了卤代磺酰胺和硫醇化合物以及包含此类反应单体的含 Si- 聚合物。