1-(4-hydroxy-3-methylphenyl)-6-hydroxy-1,3,3,5-tetramethylindan | 17689-00-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 茚满类
• 英文名称: 1-(4-hydroxy-3-methylphenyl)-6-hydroxy-1,3,3,5-tetramethylindan
• 英文别名: 5-Hydroxy-1,1,3,6-tetramethyl-3-(4'-hydroxy-3'-methyl-phenyl)-indan；1,1,3,6-Tetramethyl-3-(3-methyl-4-hydroxyphenyl)-5-indanol；3-(4-hydroxy-3-methylphenyl)-1,1,3,6-tetramethyl-2H-inden-5-ol
• CAS: 17689-00-8
• 化学式: C₂₀H₂₄O₂
• 分子量: 296.409
• InChiKey: VIESGJFRJFSPCA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.7
• 重原子数：
  22
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  4-Isopropenyl-2-methyl-phenol 在 盐酸 作用下， 以 甲苯 为溶剂， 生成 1-(4-hydroxy-3-methylphenyl)-6-hydroxy-1,3,3,5-tetramethylindan
  参考文献：
  名称：

  Kahovec,J. et al., Collection of Czechoslovak Chemical Communications, 1971, vol. 36, p. 1986 - 1994

  摘要：

  DOI：

文献信息

• BISPHENOL COMPOSITION AND POLYCARBONATE RESIN
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：US20220098135A1

  公开（公告）日：2022-03-31

  A bisphenol composition includes 95% or more by mass of a bisphenol and 200 mass ppm or more of a compound represented by the following general formula (II): In formula (II), R 21 and R 22 denote a methyl group or a hydrogen atom; R 22 is a methyl group when R 21 is a hydrogen atom; R 22 is a hydrogen atom when R 21 is a methyl group; R 23 to R 25 independently denote a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; and R 23 , R 24 , and R 25 may be bonded or cross-linked between two of the groups. A method for producing a polycarbonate resin using the bisphenol composition is also described.

  一种双酚组合物包括95%或更多的双酚和200质量ppm或更多的化合物，该化合物由以下通式(II)表示:在式(II)中，R21和R22表示甲基基团或氢原子; 当R21为氢原子时，R22为甲基基团; 当R21为甲基基团时，R22为氢原子; R23至R25独立地表示氢原子或具有1至20个碳原子的烷基基团; R23、R24和R25可以在两个基团之间键合或交联。还描述了使用双酚组合物制备聚碳酸酯树脂的方法。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445819A2

  公开（公告）日：1991-09-11

  A novel positive type photoresist composition is provided comprising a quinodiazide compound and an alkali-soluble resin as essential components, characterized in that there is contained at least one of compounds represented by formulae (I) to (VI): The positive type photoresist of the present invention exhibits excellent sensitivity, percent film remaining, resolution, heat resistance, resist shape and developability.

  本发明提供了一种新型正型光刻胶组合物，该组合物由一种喹吖啶化合物和一种碱溶性树脂作为基本成分组成，其特征在于其中含有至少一种由式（I）至（VI）表示的化合物： 本发明的正型光刻胶具有优异的灵敏度、残膜率、分辨率、耐热性、抗蚀剂形状和显影性。
• POLYCARBONATES SIUTABLE FOR USE IN OPTICAL ARTICLES
  申请人：GENERAL ELECTRIC COMPANY

  公开号：EP1165652B1

  公开（公告）日：2003-12-10
• POLYCARBONATES DERIVED FROM ALICYCLIC BISPHENOLS
  申请人：GENERAL ELECTRIC COMPANY

  公开号：EP1169703B1

  公开（公告）日：2006-05-10
• POLYESTERCARBONATE COMPRISING RESIDUES OF BRANCHED DIACIDS
  申请人：GENERAL ELECTRIC COMPANY

  公开号：EP1204693A1

  公开（公告）日：2002-05-15