A method of manufacturing an antireflection film including, in the following order, a substrate, a hard coat layer and an antireflection layer as defined herein includes: applying a hard coat layer forming composition including a crosslinking compound having a weight-average molecular weight equal to or greater than 600, a compound having a molecular weight smaller than 600 and having a photopolymerizable group and a photopolymerization initiator, onto the substrate as defined herein; semi-curing the hard coat layer forming film; applying an antireflection layer forming composition including particles, a binder resin forming compound and a solvent, onto the semi-cured hard coat layer forming film as defined herein; causing a part of the binder resin forming compound to permeate the hard coat layer forming film as defined herein; and completely curing the hard coat layer forming film and the antireflection layer forming film as defined herein.
一种制造减反射膜的方法,按以下顺序包括基底、硬涂层和本文定义的减反射膜层,该方法包括:将包括重量平均分子量等于或大于 600 的交联化合物、分子量小于 600 且具有可光聚合基团的化合物和光聚合
引发剂的硬涂层形成组合物涂在本文定义的基底上;半固化硬涂层形成薄膜;将包括颗粒、粘结剂
树脂形成化合物和溶剂在内的抗反射层形成组合物涂在本文所定义的半固化硬涂层形成膜上;使部分粘结剂
树脂形成化合物渗透到本文所定义的硬涂层形成膜中;以及完全固化本文所定义的硬涂层形成膜和抗反射层形成膜。