1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium trifluoromethanesulfonate | 627528-41-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium trifluoromethanesulfonate
• 英文别名: 2,6-Dimethyl-4-(thiolan-1-ium-1-yl)phenol;trifluoromethanesulfonate
• CAS: 627528-41-0
• 化学式: CF₃O₃S*C₁₂H₁₇OS
• 分子量: 358.403
• InChiKey: VAOHUAFTTHSCRT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.83
• 重原子数：
  22
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.54
• 拓扑面积：
  86.8
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER
  申请人：ASANO Yuusuke

  公开号：US20120156612A1

  公开（公告）日：2012-06-21

  A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R 1 represents a methyl group or the like, R 2 represents a hydrocarbon group that forms a cyclic structure, R 3 represents a fluorine atom or the like, R 4 represents a carbon atom, and n 1 is an integer from 1 to 7.

  一种辐射敏感树脂组合物包括第一聚合物，其中包括具有酸敏感基团的重复单元，在酸敏感基团解离后变为碱溶解性，并且包括辐射敏感酸发生剂。酸敏感基团具有通式（1）所示的结构。R1代表甲基基团或类似物，R2代表形成环状结构的碳氢基团，R3代表氟原子或类似物，R4代表碳原子，n1为1至7之间的整数。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：HADA Hideo

  公开号：US20120264061A1

  公开（公告）日：2012-10-18

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; Y 11 represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

  一种抗蚀组合物，包括在酸和酸发生剂组分（B）的作用下，在碱性显影溶液中表现出改变溶解性的基础组分（A），所述酸发生剂组分（B）包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1''）表示的化合物（R1''-R3''表示芳基或烷基，但至少其中一个R1''-R3''表示被(b1-1-0)表示的基团取代的取代芳基，且其中两个R1''-R3''可以相互键合以形成与硫原子形成环的环；X表示C3-C30烃基；Q1表示含有羰基的二价连接基团；X10表示C1-C30烃基；Q3表示单键或二价连接基团；Y10表示—C(═O)—或—SO2—；Y11表示C1-C10烷基或氟代烷基；Q2表示单键或烷基基团；W表示C2-C10烷基基团。
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。
• PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
  申请人：SATO Mitsuo

  公开号：US20120258402A1

  公开（公告）日：2012-10-11

  A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R 1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR 2 R 3 (OR 4 ), and R 2 to R 4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R 3 and R 4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R 3 and an oxygen atom bonded to R 4 .

  一种光阻剂组合物包括一个聚合物，该聚合物包括下式（1）所示的结构单元，以及一个光酸发生剂。在式（1）中，R1代表氢原子、氟原子、甲基基团或三氟甲基基团，Z代表与与X键合的碳原子一起形成具有3到20个碳原子的二价脂环族基团，X代表具有1到6个碳原子的脂肪二基基团，Y代表氢原子或—CR2R3(OR4)，R2到R4独立地代表氢原子或一价烃基团，其中R3和R4可选择地相互键合以与与R3键合的碳原子和与R4键合的氧原子一起形成环状醚结构。
• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Kawaue Akiya

  公开号：US20100136478A1

  公开（公告）日：2010-06-03

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

  一种抗蚀组合物，包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分（A）和在暴露后产生酸的酸发生剂组分（B），酸发生剂组分（B）包括含有由通式（I）表示的阳离子基团的化合物的酸发生剂（B1）（在该式中，R5代表具有羰基、酯键或磺酰基的有机基团；Q代表二价连接基团）。