4-甲氧苯基-3-O-烯丙基-4,6-O-苯亚甲基-2-脱氧-2-邻苯二甲酰亚氨基-β-D-吡喃葡萄糖苷 | 889453-84-3

• 物质功能分类: 医药中间体 - 杂环化合物 - 吡喃类化合物
• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 中文名称: 4-甲氧苯基-3-O-烯丙基-4,6-O-苯亚甲基-2-脱氧-2-邻苯二甲酰亚氨基-β-D-吡喃葡萄糖苷
• 中文别名: 4-甲氧苯基3-O-烯丙基-4,6-O-苯亚甲基-2-脱氧-2-苯二甲酰亚氨基-Β-D-吡喃葡萄糖苷；4-甲氧苯基3-O-烯丙基-4,6-O-苯亚甲基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷
• 英文名称: 4-Methoxyphenyl 3-O-Allyl-4,6-O-benzylidene-2-deoxy-2-phthalimido-beta-D-glucopyranoside
• 英文别名: 2-[(4aR,6S,7R,8R,8aS)-6-(4-methoxyphenoxy)-2-phenyl-8-prop-2-enoxy-4,4a,6,7,8,8a-hexahydropyrano[3,2-d][1,3]dioxin-7-yl]isoindole-1,3-dione
• CAS: 889453-84-3
• 化学式: C₃₁H₂₉NO₈
• 分子量: 543.6
• InChiKey: KDSWOYVINHSEOI-YLVCXTSJSA-N

物化性质

• 熔点：
  130 °C

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  40
• 可旋转键数：
  8
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  92.8
• 氢给体数：
  0
• 氢受体数：
  8

文献信息

• POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
  申请人：FUJIMI INCORPORATED

  公开号：EP2237311A1

  公开（公告）日：2010-10-06

  A polishing composition according to a first aspect of the present invention contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1-N(-R2)-R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one, Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition according to a second aspect of the present invention contains a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  根据本发明第一方面的抛光组合物含有含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分、含氮化合物最好选自由羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。根据本发明第二方面的抛光组合物含有水溶性聚合物和磨粒，组合物的 pH 值在 1 至 8 之间。
• Polishing composition and polishing method using the same
  申请人：Mizuno Takahiro

  公开号：US10144849B2

  公开（公告）日：2018-12-04

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  一种抛光组合物含有一种含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分。另外，含氮化合物最好选自羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。抛光组合物可包含水溶性聚合物和磨粒，组合物的 pH 值范围为 1 至 8。
• Polishing Composition and Polishing Method Using the Same
  申请人：Mizuno Takahiro

  公开号：US20100301014A1

  公开（公告）日：2010-12-02

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R 1 —N(—R 2 )—R 3 in which R 1 , R 2 , and R 3 each represent an alkyl group with or without a characteristic group, two of R 1 to R 3 may form a part of a heterocycle, and two of R 1 to R 3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.