Methacrylic acid (heptafluoropropyl) ester | 118256-17-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Methacrylic acid (heptafluoropropyl) ester
• 英文别名: 1,1,2,2,3,3,3-heptafluoropropyl 2-methylprop-2-enoate
• CAS: 118256-17-0
• 化学式: C₇H₅F₇O₂
• 分子量: 254.1
• InChiKey: YDQWGDXDFMSKFS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20150323866A1

  公开（公告）日：2015-11-12

  A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R P represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

  一种辐射敏感的树脂组合物包含：具有结构单元的聚合物，该结构单元包括由公式（1）表示的基团；辐射敏感的酸发生剂；和有机溶剂。在公式（1）中，RP表示氢原子或一价有机基团，*表示与公式（1）中表示的基团以外的结构单元的其余部分的结合位点。优选的是，在公式（1）中，RP表示一价有机基团，该一价有机基团是不可酸解的基团。还优选在公式（1）中，RP表示一价有机基团，该一价有机基团是可酸解的基团。
• PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20130230804A1

  公开（公告）日：2013-09-05

  A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A − represents —N − —SO 2 —R D , —COO − , —O − or —SO 3 − . —SO 3 − does not directly bond to a carbon atom having a fluorine atom. R D represents a linear or branched monovalent hydrocarbon group, or the like. X + represents an onium cation. -A − X + (1)

  一种图案形成方法，包括使用辐射敏感组合物在基板上提供抗蚀膜。曝光抗蚀膜。使用显影剂溶液显影曝光的抗蚀膜。显影剂溶液包括不少于80％的有机溶剂。辐射敏感组合物包括至少两种组分，包括第一聚合物和辐射敏感酸发生剂。第一聚合物包括具有酸不稳定基团的结构单元。辐射敏感组合物的一个或多个组分具有由公式（1）表示的基团。A−表示—N−—SO2—RD，—COO−，—O−或—SO3−。—SO3−不直接与具有氟原子的碳原子结合。RD表示线性或支链的一价碳氢基团等。X+表示离子上阳离子。-A−X+（1）
• PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20130224661A1

  公开（公告）日：2013-08-29

  A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

  一种形成图案的方法包括在基板上涂覆辐射敏感的树脂组合物以提供抗蚀膜。抗蚀膜被曝光。曝光的抗蚀膜被显影。用于显影曝光的抗蚀膜的显影剂溶液包括不少于80%的有机溶剂。辐射敏感的树脂组合物包括第一聚合物和辐射敏感的酸发生剂。第一聚合物包括具有酸不稳定基团和脂环族基团的第一结构单元。脂环族基团能够通过酸的作用避免从分子链中解离。
• RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
  申请人：JSR CORPORATION

  公开号：US20160185999A1

  公开（公告）日：2016-06-30

  A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R 1 to R 4 has the fluorine atom or a group including the fluorine atom. R 5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

  一种树脂组合物，包括聚合物和溶剂。该聚合物包括一个结构单元，该结构单元包括由公式（1）表示的基团，其中在公式（1）中，R1至R4分别独立地表示氢原子、氟原子或具有1至20个碳原子的单价有机基团，其中至少有一个R1至R4包括氟原子或包括氟原子的基团。R5表示具有1至7个碳原子的取代或未取代的三价链烃基团。*表示与结构单元的其他部分结合的位点。该结构单元最好由公式（2-1）至（2-3）中的任何一个表示。在公式（2-1）至（2-3）中，Z表示由公式（1）表示的基团。
• CROSS-LINKED CO-POLYMERS FOR MAKING OPTOELECTRONIC DEVICES
  申请人：Empire Technology Development LLC

  公开号：US20160200845A1

  公开（公告）日：2016-07-14

  Compositions, devices, and methods are provided regarding cross-linked co-polymers that include chromophores, where the chromophores are aligned so as to provide electro-optic activity to the cross-linked co-polymer.

  提供了关于包含色团的交联共聚物的组合物、装置和方法，其中色团被排列以向交联共聚物提供电光活性。