1-ethylcyclododecyl methacrylate | 691401-93-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-ethylcyclododecyl methacrylate
• 英文别名: (1-Ethylcyclododecyl) 2-methylprop-2-enoate
• CAS: 691401-93-1
• 化学式: C₁₈H₃₂O₂
• 分子量: 280.451
• InChiKey: ZEDQPWIBEQDZIQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.9
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• [EN] CHEMICALLY AMPLIFIED POLYMER HAVING PENDANT GROUP WITH CYCLODODECYL AND RESIST COMPOSITION COMPRISING THE SAME<br/>[FR] POLYMERE A AMPLIFICATION CHIMIQUE COMPRENANT UN GROUPE PENDANT AVEC CYCLODODECYLE ET COMPOSITION DE RESINE LE RENFERMANT
  申请人：DONGJIN SEMICHEM CO LTD

  公开号：WO2004041770A1

  公开（公告）日：2004-05-21

  The present invention relates to a chemically amplified polymer having a pendent group with cyclododecyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with cyclododecyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.

  本发明涉及一种具有与环十二烷键合的侧链基团的化学增感聚合物，其制备方法，以及包括它的抗蚀剂组合物，更具体地说，涉及一种新型的（甲基）丙烯酸或诺博烯羧酸酯化合物，其与环十二烷键合，其制备方法，用其合成的化学增感聚合物，以及包括该聚合物的用于ArF的正向光刻胶组合物，具有高分辨率和优异的蚀刻抗性。
• Low activation energy photoresist composition and process for its use
  申请人：Allen Robert David

  公开号：US20070275324A1

  公开（公告）日：2007-11-29

  The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

  本发明涉及一种辐射敏感的光刻胶组合物。该组合物包括至少两种单体的聚合物。第一种单体具有酸可裂解的三级酯基团。第二种单体是酸性单体。聚合物的酸可裂解酯基团具有惊人的低活化能，从而在印刷工艺中提高了抗蚀图像的质量。
• Low Activation Energy Photoresist Composition and Process for Its Use
  申请人：Allen Robert David

  公开号：US20110008727A1

  公开（公告）日：2011-01-13

  The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

  本发明涉及一种辐射敏感的光阻组合物。该组合物包括至少两种单体的聚合物。第一种单体具有酸可裂解的三级酯基团。第二种单体是酸性单体。聚合物的酸可裂解酯基团具有惊人的低活化能，从而在光刻工艺中获得改进的阻抗图像。
• US7476492B2
  申请人：——

  公开号：US7476492B2

  公开（公告）日：2009-01-13
• US8168366B2
  申请人：——

  公开号：US8168366B2

  公开（公告）日：2012-05-01