Catalytic C(sp
<sup>3</sup>
)−H Arylation of Free Primary Amines with an
<i>exo</i>
Directing Group Generated In Situ
作者:Yan Xu、Michael C. Young、Chengpeng Wang、David M. Magness、Guangbin Dong
DOI:10.1002/anie.201604268
日期:2016.7.25
Herein, we report the palladium‐catalyzeddirectarylation of unactivated aliphatic C−H bonds in free primary amines. This method takes advantage of an exo‐imine‐type directing group (DG) that can be generated and removed in situ. A range of unprotected aliphatic amines are suitable substrates, undergoing site‐selective arylation at the γ‐position. Methyl as well as cyclic and acyclic methylene groups
Base‐Mediated O‐Arylation of Alcohols and Phenols by Triarylsulfonium Triflates
作者:Xiao‐Xia Ming、Ze‐Yu Tian、Cheng‐Pan Zhang
DOI:10.1002/asia.201900968
日期:2019.10
A mild and efficient protocol for O-arylation of alcohols and phenols (ROH) by triarylsulfonium triflates was developed under transition-metal-free conditions. Various alcohols, including primary, secondary and tertiary, and phenols bearing either electron-donating or electron-withdrawing groups on the aryl rings were smoothly converted to form the corresponding aromatic ethers in moderate to excellent
The Cu-catalyzed regioselective synthesis of phenazine N-oxides was realized from benzoxadiazoles and diaryliodonium salts. The process was initiated by the electrophilic arylation of benzoxadiazoles with diaryliodonium salts and followed by benzocyclization reactions. The further reduction of N-oxides in situ to phenazine scaffolds and deviation to organic fluorescent materials were readily accomplished
Diverse Tandem Cyclization Reactions of <i>o</i>-Cyanoanilines and Diaryliodonium Salts with Copper Catalyst for the Construction of Quinazolinimine and Acridine Scaffolds
Two cyclization modes are realized to produce different nitrogen-containing heterocycles, i.e., quinazolin-4(3H)-imines and acridines by assembling o-cyanoanilines and diaryliodonium salts via tandem reaction pathways.
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20160145231A1
公开(公告)日:2016-05-26
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.