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N-propylglutamic acid | 4754-14-7

中文名称
——
中文别名
——
英文名称
N-propylglutamic acid
英文别名
N-propyl-L-Glu;N-propyl-L-glutamic acid;N-Propyl-L-glutaminsaeure;L-2-Propylamino-glutarsaeure;Propylglutamic acid;(2S)-2-(propylamino)pentanedioic acid
N-propylglutamic acid化学式
CAS
4754-14-7
化学式
C8H15NO4
mdl
——
分子量
189.211
InChiKey
YMOYQSJBJFKEGV-LURJTMIESA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    171 °C
  • 沸点:
    349.8±32.0 °C(Predicted)
  • 密度:
    1.189±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    -2.1
  • 重原子数:
    13
  • 可旋转键数:
    7
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.75
  • 拓扑面积:
    86.6
  • 氢给体数:
    3
  • 氢受体数:
    5

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    L-谷氨酸丙醛 在 sodium cyanoborohydride 作用下, 以 甲醇 为溶剂, 反应 18.0h, 以75%的产率得到N-propylglutamic acid
    参考文献:
    名称:
    AN EFFICIENT ONE-STEP REDUCTIVEN-MONOALKYLATION OF α-AMINO ACIDS
    摘要:
    在氰基硼氢化钠存在下,无保护的 a-氨基酸与醛或酮发生反应,得到无机盐形式的 N-单烷基化氨基酸。此外,还介绍了该方法在合成具有重要生物价值的氨基酸的 N-烷基衍生物中的应用。
    DOI:
    10.1246/cl.1984.441
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文献信息

  • Bio-based N-alkyl-2-pyrrolidones by Pd-catalyzed reductive N-alkylation and decarboxylation of glutamic acid
    作者:Free De Schouwer、Sander Adriaansen、Laurens Claes、Dirk E. De Vos
    DOI:10.1039/c7gc01829k
    日期:——
    controversial high-boiling solvents such as N-methyl-2-pyrrolidone and N,N-dimethylformamide in the chemical industry. Recently, N-alkyl-2-pyrrolidones and 5-methyl-N-alkyl-2-pyrrolidones were proposed as attractive alternative solvents for many applications. Here, we report a bio-based two-step chemocatalytic system for the synthesis of a broad range of N-alkyl-2-pyrrolidones starting from glutamic acid
    环保法规推动新的更安全,毒性较低的生物基溶剂的查找替换争议的高沸点溶剂,如ñ甲基-2-吡咯烷酮和ñ,ñ在化工行业二甲基甲酰胺。最近,N-烷基-2-吡咯烷酮和5-甲基-N-烷基-2-吡咯烷酮被提议作为许多应用的有吸引力的替代溶剂。在这里,我们报告了一种基于生物的两步化学催化系统,该系统可以从谷酸和C 3 -C 5羰基化合物开始合成范围广泛的N-烷基-2-吡咯烷酮。第一步N通过温和且有效的Pd催化的还原性N-烷基化以高产率(> 85%)合成了谷酸的α-单烷基化衍生物。随后,在惰性气氛下在250℃下热诱导内酰胺化成相应的N-烷基焦谷酸,然后Pd催化脱羧,得到N-烷基-2-吡咯烷酮。通过用碱中和N-烷基焦谷酸底物,部分抵消了解降解,导致产率高达82%。最后,两个反应步骤在相同的Pd / Al 2 O 3催化剂下,在不同的气体气氛和温度条件下,通过一锅法成功地结合在一起。
  • PARAKERATOSIS INHIBITOR, PORE SHRINKING AGENT OR AGENT FOR PREVENTING OR IMPROVING ROUGH SKIN, AND COMPOSITION FOR EXTERNAL USE ON THE SKIN CONTAINING THE SAME
    申请人:Shiseido Company, Ltd.
    公开号:EP2255780A1
    公开(公告)日:2010-12-01
    The present invention provides a parakeratosis inhibitor, a pore-shrinking agent, and a rough skin inhibiting or ameliorating agent comprising, as an active ingredient, a compound that has excellent effects and high safety without safety problems such as sensory irritation, and provides an external composition for skin containing the same. The compound is selected from the glutamic acid derivatives represented by formula (1) or (2) and the salts thereof: wherein A represents a carbamoyl group, a benzyloxycarbonyl group, an alkyl group having 1 to 3 carbon atoms, an allyl group, or an amidino group; wherein Z represents an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, etc.; Y represents OH, an alkyloxy group having 1 to 3 carbon atoms, an allyloxy group, or NR3R4; R1 to R4 each independently represents H, an alkyl group having 1 to 3 carbon atoms, an allyl group, a cycloalkyl group having 3 to 7 carbon atoms, a cycloalkenyl group having 3 to 7 carbon atoms, a phenyl group, or a benzyl group, or R1 and R2, or R3 and R4, independently form a heterocycle.
    本发明提供了一种角化抑制剂、毛孔收缩剂和皮肤粗糙抑制或改善剂,其活性成分包括一种效果优异、安全性高且不存在感官刺激等安全问题的化合物,并提供了一种含有该化合物的皮肤外用组合物。该化合物选自式(1)或(2)代表的谷酸衍生物及其盐类: 其中 A 代表基甲酰基、苄氧羰基、具有 1 至 3 个碳原子的烷基、烯丙基或脒基; 其中 Z 代表具有 1 至 4 个碳原子的烷基、具有 2 至 4 个碳原子的烯基等。R1 至 R4 各自独立地代表 H、具有 1 至 3 个碳原子的烷基、烯丙基、具有 3 至 7 个碳原子的环烷基、具有 3 至 7 个碳原子的环烯基、苯基或苄基,或 R1 和 R2 或 R3 和 R4 独立地形成杂环。
  • METAL-POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD BY USING THE SAME
    申请人:KATO Tomoo
    公开号:US20080188079A1
    公开(公告)日:2008-08-07
    The present invention provides a metal-polishing composition for use in chemical mechanical polishing of semiconductor devices, comprising: (a) a compound represented by the following Formula A, (b) a compound represented by the following Formula B, (c) an abrasive grain, and (d) an oxidizing agent: in Formula A, R 1 represents an alkyl group having 1 to 3 carbon atoms; and R 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and in Formula B, R 3 , R 4 , and R 5 each independently represent a hydrogen atom, or an alkyl, aryl, alkoxy, amino, aminoalkyl, hydroxy, hydroxyalkyl, carboxy, carboxyalkyl or carbamoyl group.
  • Parakeratosis Inhibitor, Pore-Shrinking Agent, Or Rough Skin Inhibiting/Ameliorating Agent, And External Composition For Skin Containing The Same
    申请人:Iida Toshii
    公开号:US20110004019A1
    公开(公告)日:2011-01-06
    The present invention provides a parakeratosis inhibitor, a pore-shrinking agent, and a rough skin inhibiting or ameliorating agent comprising, as an active ingredient, a compound that has excellent effects and high safety without safety problems such as sensory irritation, and provides an external composition for skin containing the same. The compound is selected from the glutamic acid derivatives represented by formula (1) or (2) and the salts thereof: wherein A represents a carbamoyl group, a benzyloxycarbonyl group, an alkyl group having 1 to 3 carbon atoms, an allyl group, or an amidino group; wherein Z represents an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, etc.; Y represents OH, an alkyloxy group having 1 to 3 carbon atoms, an allyloxy group, or NR 3 R 4 ; R 1 to R 4 each independently represents H, an alkyl group having 1 to 3 carbon atoms, an allyl group, a cycloalkyl group having 3 to 7 carbon atoms, a cycloalkenyl group having 3 to 7 carbon atoms, a phenyl group, or a benzyl group, or R 1 and R 2 , or R 3 and R 4 , independently form a heterocycle.
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