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[Zn(caproate)2] | 144188-92-1

中文名称
——
中文别名
——
英文名称
[Zn(caproate)2]
英文别名
Zinc caproate;zinc;hexanoate
[Zn(caproate)2]化学式
CAS
144188-92-1
化学式
C12H22O4Zn
mdl
——
分子量
295.694
InChiKey
PKJOUIVGCFHFTK-UHFFFAOYSA-L
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.63
  • 重原子数:
    17
  • 可旋转键数:
    6
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.83
  • 拓扑面积:
    80.3
  • 氢给体数:
    0
  • 氢受体数:
    4

反应信息

  • 作为反应物:
    描述:
    [Zn(caproate)2] 以 neat (no solvent) 为溶剂, 生成 zinc(II) oxide
    参考文献:
    名称:
    己酸某些螯合物的FTIR,磁,1H NMR光谱和热研究:对不同种类细菌的抑制作用。
    摘要:
    报道了一种方便的方法来制备Cr3 +,Mn2 +,Fe3 +,Co2 +,Ni2 +,Zn2 +,ZrO2 +,UO2(2 +),Zr4 +和Th4 +离子与己酸(Hcap)的配合物,这使10种己酸配合物成为可能。要配制的阴离子:[Cr(cap)3] .5H2O,[Mn(cap)2(H2O)2],[Fe(cap)3] .12H2O,[Co(cap)2(H2O)2] .4H2O ,[Ni(cap)2(H2O)2] .3H2O,[Zn(cap)2],[ZrO(cap)2] .3H2O,[UO2(cap)(NO3)],[Zr(cap)2( Cl)2]和[Th(cap)4]。通过元素分析,摩尔电导率,磁测量,光谱方法(中红外,1H NMR和UV-vis光谱)和同时热分析(TG和DTG)技术对这些新的配合物进行了合成和表征。从元素分析和热学研究中发现,己酸酯配体表现为双齿配体,并以1:1(金属:配体)化学计量比形成UO2(2
    DOI:
    10.1016/j.saa.2007.07.036
  • 作为产物:
    描述:
    己酸 、 zinc dibromide 在 sodium hydroxide 作用下, 以 neat (no solvent) 为溶剂, 生成 [Zn(caproate)2]
    参考文献:
    名称:
    己酸某些螯合物的FTIR,磁,1H NMR光谱和热研究:对不同种类细菌的抑制作用。
    摘要:
    报道了一种方便的方法来制备Cr3 +,Mn2 +,Fe3 +,Co2 +,Ni2 +,Zn2 +,ZrO2 +,UO2(2 +),Zr4 +和Th4 +离子与己酸(Hcap)的配合物,这使10种己酸配合物成为可能。要配制的阴离子:[Cr(cap)3] .5H2O,[Mn(cap)2(H2O)2],[Fe(cap)3] .12H2O,[Co(cap)2(H2O)2] .4H2O ,[Ni(cap)2(H2O)2] .3H2O,[Zn(cap)2],[ZrO(cap)2] .3H2O,[UO2(cap)(NO3)],[Zr(cap)2( Cl)2]和[Th(cap)4]。通过元素分析,摩尔电导率,磁测量,光谱方法(中红外,1H NMR和UV-vis光谱)和同时热分析(TG和DTG)技术对这些新的配合物进行了合成和表征。从元素分析和热学研究中发现,己酸酯配体表现为双齿配体,并以1:1(金属:配体)化学计量比形成UO2(2
    DOI:
    10.1016/j.saa.2007.07.036
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文献信息

  • [EN] HARDENERS FOR THERMOSETTABLE RESIN COMPOSITIONS<br/>[FR] DURCISSEURS POUR COMPOSITIONS DE RÉSINE THERMODURCISSABLE
    申请人:DOW GLOBAL TECHNOLOGIES LLC
    公开号:WO2011146106A1
    公开(公告)日:2011-11-24
    A multifunctional aromatic amine hardener composition including the reaction condensation product of (a) at least one aniline and (b) at least one non-aromatic cyclic dicarboxaldehyde; and a reactive thermosettable resin composition including (i) at least one multifunctional aromatic amine hardener composition curing agent, (ii) at least one thermoset resin, and optionally (c) at least one catalyst; and a process for preparing a thermoset product from the thermosettable composition. The hardener composition above and a thermoset resin may be used to prepare a thermoset product with improved thermo- mechanical behavior.
    一种多功能芳香胺硬化剂组合物,包括(a)至少一种苯胺和(b)至少一种非芳香环状二羧醛的反应缩合产物;以及一种反应性热固性树脂组合物,包括(i)至少一种多功能芳香胺硬化剂组合物固化剂,(ii)至少一种热固性树脂,和可选地(c)至少一种催化剂;以及一种从该热固性组合物制备热固性产品的方法。上述硬化剂组合物和热固性树脂可用于制备具有改善热机械性能的热固性产品。
  • [EN] PROCESS FOR PREPARING 2-(SUBSTITUTED PHENYL) - 2 - HYDROXY-ETHYL CARBAMATES<br/>[FR] PROCEDE DE PREPARATION DE 2-(PHENYLE SUBSTITUE) - 2 - HYDROXY-ETHYLE CARBAMATES
    申请人:CILAG AG
    公开号:WO2003053916A1
    公开(公告)日:2003-07-03
    The invention concerns a new process for preparing (S)-(+)-2-(substituted phenyl)-2-hydroxy-ethyl carbamates and to novel intermediates used in this process. It further relates to polymorphic forms of said carbamates and to processes for preparing said polymorphic forms.
    本发明涉及一种制备(S)-(+)-2-(取代苯基)-2-羟基乙基氨基甲酸酯的新工艺,并涉及用于该工艺的新中间体。此外,还涉及所述氨基甲酸酯的多形式和制备所述多形式的工艺。
  • Process for preparing 2-(substituted phenyl)-2-hydroxy-ethyl carbamates
    申请人:Ortho-McNeil Pharmaceutical, Inc.
    公开号:EP2248799A1
    公开(公告)日:2010-11-10
    The invention concerns a process for preparing (S)-(+)-2-(substituted phenyl)-2-hydroxy-ethyl carbamates and to novel intermediates used in this process.
    本发明涉及一种制备(S)-(+)-2-(取代苯基)-2-羟基乙酰氨基酸乙酯的方法,并涉及在该方法中使用的新型中间体。
  • Process for producing coatings using surface-active photoinitiators
    申请人:——
    公开号:US20030213931A1
    公开(公告)日:2003-11-20
    Compounds of formula (I) in which r is a number 1 or 2; s is a number from 1 to 1000; R is radical of formula (II); or R is, for example, unsubstituted or substituted naphthyl, anthracyl, phenanthryl or a heterocyclic radical; R 1 , R 2 , R 3 , R 4 and R 5 independently of one another are, for example hydrogen; unsubstituted or substituted phenyl or C 1 -C 12 alkyl; A, if s is 1, is a surface-active radical of formula (III); or A, if s is 1, is a surface-active radical A 0 ; or A, if s is a number greater than 1, is a radical of the formula (III) in which n corresponds to the number s, or A, if s is 2, is a radical A 1 ; A 0 is, for example, in each case unsubstituted or substituted C 6 -C 30 alkyl, C 6 -C 30 alkenyl, C 6 -C 30 alkynyl or C 6 -C 30 aralkyl; A 1 is, for example, in each case unsubstituted or substituted C 6 -C 30 alkylene, C 6 -C 30 alkenylene, C 6 -C 30 alkynylene or C 6 -C 30 aralkylene; n is, for example, a number from 1 to 1000; m is a number from 0 to 100; p is a number 0-10000; x is a number C from 1 to 10; Y, if r is 1, is a divalent group and Y, if r is 2, is a trivalent group, and Y, if A has the definition A 0 , is a single bond; G 1 , G 2 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 and R 22 are, for exmple, C 1 -C 18 alkyl; are particularly suitable as photoinitiators which accumulate at the surface in a process for curing coatings.
    公式(I)的化合物中,r为1或2的数字;s为1至1000的数字;R为公式(II)的基团;或者R为未取代或取代的基、基、基或杂环基团;R1、R2、R3、R4和R5各自独立地为氢、未取代或取代的苯基或C1-C12烷基;如果s为1,则A为公式(III)的表面活性基团;或者如果s为1,则A为表面活性基团A0;或者如果s为大于1的数字,则A为公式(III)的基团,其中n对应于数字s;或者如果s为2,则A为基团A1;例如,A0为未取代或取代的C6-C30烷基、C6-C30烯基、C6-C30炔基或C6-C30芳基烷基;A1为未取代或取代的C6-C30亚烷基、C6-C30亚烯基、C6-C30亚炔基或C6-C30芳基亚烷基;n为1至1000的数字;m为0至100的数字;p为0至10000的数字;x为1至10的数字;如果r为1,则Y为二价基团;如果r为2,则Y为三价基团;如果A具有定义A0,则Y为单键;G1、G2、R13、R14、R15、R16、R17、R18、R19、R20、R21和R22例如为C1-C18烷基;特别适用于在固化涂层过程中在表面积累的光引发剂
  • Surface-active photoinitiators
    申请人:——
    公开号:US20040014832A1
    公开(公告)日:2004-01-22
    Compounds of formula Ia, Ib and Ic, (Ic), in which R, R 1 and R 2 are e.g. phenyl, naphthyl, anthracyl, phenanthryl or a heterocyclic radical, are suitable as photoinitiators which accumulate at the surface of coatings.
    公式Ia、Ib和Ic的化合物(Ic),其中R、R1和R2例如苯基、基、基、基或杂环基,适用于在涂层表面积累的光引发剂
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