4,4,8,11,11-Pentamethyl-3,5,7,10,12-pentaoxatricyclo[7.3.0.02,6]dodecane

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二氧吡喃
• 英文名称: 4,4,8,11,11-Pentamethyl-3,5,7,10,12-pentaoxatricyclo[7.3.0.02,6]dodecane
• 化学式: C₁₂H₂₀O₅
• 分子量: 244.28
• InChiKey: FBWQLTARTKWGMT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  17
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  46.2
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• [EN] COMPOUNDS<br/>[FR] COMPOSÉS
  申请人：UNIV OSLO

  公开号：WO2018033719A1

  公开（公告）日：2018-02-22

  The invention provides compounds for use in a method of treating and/or preventing a bacterial infection in a human or non-human mammal, said method comprising administration of said compound in combination with (either simultaneously, separately, or sequentially) a β-lactam antibiotic, wherein said compound has the general formula I: (I) (wherein: Q is a lipophilic, zinc chelating moiety which is selective for Zn2+ ions and which comprises at least one, preferably two or more (e.g 2, 3 or 4), optionally substituted, unsaturated heterocyclic rings, e.g. 5 or 6-membered heterocyclic rings (such rings preferably include at least one heteroatom selected from N, S and O, preferably N); wherein any optional substituents may be selected from C1-6 alkyl, C1-6 alkoxy, halogen, nitro, cyano, amine, and substituted amine; each L, which may be the same or different, is a covalent bond or a linker; each W, which may be the same or different, is a non-peptidic hydrophilic group which comprises one or more hydroxy groups; and x is an integer from 1 to 3) or a stereoisomer, pharmaceutically acceptable salt or prodrug thereof.

  该发明提供了一种化合物，用于治疗和/或预防人类或非人哺乳动物体内的细菌感染，所述方法包括将该化合物与β-内酰胺类抗生素（可以同时、分开或顺序地）结合给药，其中所述化合物具有一般式I：（I）（其中：Q是一个亲脂性、选择性结合Zn2+离子的基团，包括至少一个，最好是两个或更多（例如2、3或4个），可选择地取代的不饱和杂环环，例如5或6元杂环环（这些环最好包括至少一个从N、S和O中选择的杂原子，最好是N）；其中任何可选择的取代基可以选择自C1-6烷基、C1-6烷氧基、卤素、硝基、氰基、胺和取代胺；每个L，可以相同也可以不同，是一个共价键或一个连接基；每个W，可以相同也可以不同，是一个非肽性亲水基团，包括一个或多个羟基；x是1到3之间的整数）或其立体异构体、药学上可接受的盐或前药。
• Latent acids and their use
  申请人：Yamato Hitoshi

  公开号：US20110217654A1

  公开（公告）日：2011-09-08

  The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH 2 or CO; Y is O, NR 4 , S, O(CO), O(CO)O, O(CO)NR 4 , OSO 2 , O(CS), or O(CS)NR 4 ; R 1 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 2 -C 18 alkyl, interrupted C 3 -C 30 cycloalkyl, interrupted C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 4 -C 30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R 1 is NR 12 R 13 ; R 2 and R 3 are for example C 3 -C 30 cycloalkylene, C 3 -C 30 cycloalkyl-C 1 -C 18 alkylene, C 1 -C 18 alkylene, C 1 -C 10 haloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R 4 is for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl; R 12 and R 13 are for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, Ar, (CO)R 15 , (CO)OR 15 or SO 2 R 15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  本发明涉及一种生成公式I或II的酸的化合物，例如对应的磺鎓盐和碘鎓盐，以及对应的磺酰氧肟，其中X为CH2或CO；Y为O、NR4、S、O（CO）、O（CO）O、O（CO）NR4、OSO2、O（CS）或O（CS）NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、Ar、（CO）R15、（CO）OR15或SO2R15；Ar为苯基、苯并二氢呋喃基、菲基、萘基、蒽基、苯并蒽基或杂环基，全部未取代或被取代。
• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION COMME ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2009150074A1

  公开（公告）日：2009-12-17

  Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X- is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.

  公式（I）的化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y是O，S或CO; D2，D3和D4例如是直接键，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO），（CO）NR7，SO，SO2或OSO2，C1-C18烷基，C3-C30环烷基，C2-C12烯基，C4-C30环烯基，Ar1; Ar1，Ar2和Ar3例如是苯基，R4，R5，R6，R7和R8例如是氢，C3-C30环烷基，C1-C18烷基，C1-C10卤代烷基，C2-C12烯基，C4-C30环烯基，苯基-C1C3-烷基; X-是公式（IA），（IB）或（IC）; R10例如是C1-C18烷基，C1-C10卤代烷基，桉叶基，苯基-C1-C3烷基，C3-C30环烷基; R11，R12，R13，R14和R15例如是C1-C10卤代烷基; 作为可聚合光致酸的有用化合物。
• Sulfonate derivatives and the use thereof as latent acids
  申请人：Matsumoto Akira

  公开号：US20080286693A1

  公开（公告）日：2008-11-20

  Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb or VIa wherein n is 1 or 2; m is 0 or 1; X 0 is —[CH 2 ] h —X or —CH═CH 2 ; h is 2, 3, 4, 5 or 6; R 1 , when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R 1 , when n is 2, is for example optionally substituted phenylene or naphthylene; R 2 for example has one of the meanings of R 1 ; X is for example —OR 20 , —NR 21 R 22 , —SR 23 ; X′ is —X 1 -A 3 -X-; X 1 and X 2 are for example —O—, —S— or a direct bond; A 3 is e.g. phenylene; R 3 has for example one of the meanings given for R 1 ; R 4 has for example one of the meaning given for R 2 ; R 5 and R 6 e.g. are hydrogen; G i.a. is —S— or —O—; R 7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R 8 and R 9 e.g. are C 1 -C 18 alkyl; R 10 has one of the meanings given for R 7 ; R 11 i.a. is C 1 -C 18 alkyl; R 12 , R 13 , R 14 , R 15 R 16 , R 17 and R 18 for example are hydrogen or C 1 -C 18 alkyl; R 20 , R 21 , R 22 and R 23 i.a. are phenyl or C 1 -C 18 alkyl; give high resolution with good resist profile.

  化学增感光阻剂组合物包括：(a)一种在酸的作用下固化的化合物或一种在酸的作用下溶解度增加的化合物；以及(b)式Ia、Ib、IIa、IIb、IIIa、IIIb、IVa、IVb、Va、Vb或VIa中的一种化合物，其中n为1或2；m为0或1；X0为—[CH2]h—X或—CH═CH2；h为2、3、4、5或6；当n为1时，R1例如为可选取代的苯基、萘基、蒽基、菲基或杂环芳基；当n为2时，R1例如为可选取代的苯基或萘基；R2例如具有R1的一种含义；X例如为—OR20、—NR21R22、—SR23；X′为—X1-A3-X-；X1和X2例如为—O—、—S—或直接键；A3例如为苯基；R3例如具有R1给出的一种含义；R4例如具有R2给出的一种含义；R5和R6例如为氢；G例如为—S—或—O—；当n为1时，R7例如为可选取代的苯基，当n为2时，例如为苯基；R8和R9例如为C1-C18烷基；R10具有R7给出的一种含义；R11例如为C1-C18烷基；R12、R13、R14、R15、R16、R17和R18例如为氢或C1-C18烷基；R20、R21、R22和R23例如为苯基或C1-C18烷基；具有良好的抗蚀性能和高分辨率。