申请人:Nissan Chemical Industries, Ltd.
公开号:EP1560070A1
公开(公告)日:2005-08-03
There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
本发明提供了一种用于形成防反射涂层的组合物,该组合物对用于制造半导体器件的波长的光具有良好的吸收性,对光的反射具有较高的保护效果,与光刻胶层相比具有较高的干蚀刻率。具体来说,用于形成抗反射涂层的组合物含有一种三嗪三酮化合物、低聚物化合物或聚合物化合物,其氮原子上的取代基为羟烷基结构。