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Azelaic anhydride | 45289-91-6

中文名称
——
中文别名
——
英文名称
Azelaic anhydride
英文别名
9-(8-Carboxyoctanoyloxy)-9-oxononanoic acid;9-(8-carboxyoctanoyloxy)-9-oxononanoic acid
Azelaic anhydride化学式
CAS
45289-91-6
化学式
C18H30O7
mdl
——
分子量
358.432
InChiKey
XBZWSZLNCWTVRA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    534.8±35.0 °C(Predicted)
  • 密度:
    1.136±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3.4
  • 重原子数:
    25
  • 可旋转键数:
    18
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.78
  • 拓扑面积:
    118
  • 氢给体数:
    2
  • 氢受体数:
    7

反应信息

  • 作为反应物:
    描述:
    Azelaic anhydride吉西他滨 以91%的产率得到5-((1-((2R,4R,5R)-3,3-difluoro-4-hydroxy-5-(hydroxymethyl) tetrahydrofuran-2-yl)-2-oxo-1,2-dihydro-pyrimidin-4-yl)amino)-5-oxo-nonanoic acid
    参考文献:
    名称:
    Gemcitabine Derivatives, Compositions Comprising Same and Pharmaceutical Applications Thereof
    摘要:
    本发明提供了以下式(I)所示的吉西他滨衍生物及其制备方法。本发明还涉及一种制药组合物,其包含所述吉西他滨衍生物的有效量和药学上可接受的辅料或添加剂。本发明还提供了利用所述衍生物制备抗肿瘤药物的用途。本发明设计的化合物在结构上是新颖的,并具有显著的抗肿瘤活性。根据本发明设计的化合物,制备起始原料来源广泛且易得,制备方法简单易操作,产物收率高,从而便于大规模工业生产。
    公开号:
    US20160304550A1
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文献信息

  • [EN] PEPTIDE-CONJUGATED PRODRUGS<br/>[FR] PROMÉDICAMENTS CONJUGUÉS À UN PEPTIDE
    申请人:UNIV BRANDEIS
    公开号:WO2021055690A1
    公开(公告)日:2021-03-25
    The present disclosure relates to a conjugated prodrug comprising a peptide conjugated to an antibiotic molecules via a cleavable linker and pharmaceutical compositions thereof. Also disclosed are methods of enhancing the intracellular concentration of an antibiotic agent in a bacterium and methods of treating a patient for a bacterial infection.
    本公开涉及一种共轭前药,包括通过可切割连接物将肽与抗生素分子结合在一起的药物,并其制药组合物。还公开了增强细菌内抗生素药物浓度的方法以及治疗患有细菌感染的患者的方法。
  • [EN] COMPOUNDS AND METHODS FOR THE PRODUCTION OF LONG CHAIN HYDROCARBONS FROM BIOLOGICAL SOURCES<br/>[FR] COMPOSÉS ET PROCÉDÉS DE PRODUCTION D'HYDROCARBURES À CHAÎNE LONGUE À PARTIR DE SOURCES BIOLOGIQUES
    申请人:LOS ALAMOS NAT SECURITY LLC
    公开号:WO2013040311A1
    公开(公告)日:2013-03-21
    The present invention is directed to the preparation of oxygenated, unsaturated hydrocarbon compounds, such as derivatives of furfural or hydroxymethyl furfural produced by aldol condensation with a ketone or a ketoester, as well as methods of deoxidatively reducing those compounds with hydrogen under acidic conditions to provide saturated hydrocarbons useful as fuels.
    本发明涉及制备氧化的不饱和碳氢化合物,例如通过醛缩反应与酮或酮酯生物糠醛或羟甲基糠醛制备的化合物,以及在酸性条件下用氢脱氧还原这些化合物的方法,以提供作为燃料有用的饱和碳氢化合物。
  • ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR
    申请人:WAKO PURE CHEMICAL INDUSTRIES, LTD.
    公开号:US20190002403A1
    公开(公告)日:2019-01-03
    The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.
    本发明涉及一种由通式(A)表示的化合物,包括该化合物的生成碱基和/或基团产生剂等。在该式中,四个R1分别独立表示氢原子或原子;四个R2分别独立表示原子或三甲基基团;R3、R6、R7和R10分别独立表示氢原子或具有1至12个碳原子的烷基基团;R4和R5分别独立表示氢原子或具有1至12个碳原子的烷基基团,或者R4和R5相互连接表示具有2至4个碳原子的亚烷基基团;R8和R9分别独立表示氢原子、具有1至12个碳原子的烷基基团或具有6至14个碳原子且可选地具有选自包括具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至6个碳原子的烷基团、具有2至12个碳原子的二烷基基团、卤素原子和硝基基团的取代基的芳基团,或者R8和R9相互连接表示具有2至4个碳原子的亚烷基基团;前提是八个基团R3至R10中的两个或三个分别是氢原子,并且在其中两个基团分别是氢原子的情况下,其余基团中的三到六个分别是具有1至12个碳原子的烷基基团,而在其中三个基团分别是氢原子的情况下,其余基团中的四个或五个分别是具有1至12个碳原子的烷基基团。
  • BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
    申请人:WAKO PURE CHEMICAL INDUSTRIES, LTD.
    公开号:US20160122292A1
    公开(公告)日:2016-05-05
    It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)
    本发明的一个目的是提供一种基发生剂,其对通用有机溶剂具有高溶解度,可以直接溶解为一种碱反应性化合物,例如基于环氧树脂的化合物,进一步具有高耐热性和低亲核性的性能,并生成强碱,包括基发生剂和碱反应性化合物的碱反应性组合物,以及生成碱的方法等。本发明涉及一种由通式(A)表示的化合物,包括该化合物的基发生剂,包括基发生剂和碱反应性化合物的碱反应性组合物,以及生成碱的方法等。(其中R1至R5各自独立地表示氢原子;烷基基团;可能具有取代基的芳基团;或可能具有取代基的芳基烷基基团,R6表示氢原子;可能具有取代基的烷基基团;烯基基团;炔基基团;可能具有取代基的芳基团;或可能具有取代基的芳基烷基基团,R7表示氢原子;可能具有基的烷基基团;可能具有取代基的芳基团;或可能具有取代基的芳基烷基基团,Z-表示从具有特定结构的羧酸衍生的阴离子。)
  • Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US10197914B2
    公开(公告)日:2019-02-05
    The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.
    本发明提供了一种含有(A)含有硅氧烷链的聚合物化合物的阳性感光树脂组合物,该聚合物化合物具有由通式(1)所示的重复单元和重量平均分子量为3,000至500,000,(B)能够通过光生成酸并增加在性碱性溶液中的溶解速率的感光材料,(C)交联剂和(D)溶剂。可以提供一种阳性感光树脂组合物,可以解决在属线路(如Cu和Al)、电极和基板上引起的剥离问题,特别是在SiN等基板上,可以在使用广泛的2.38%TMAH溶液作为显影剂时,在图案底部和基板上形成具有前向锥形形状的细微图案,而不会产生污点和底部轮廓。
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