申请人:Ciba-Geigy Corporation
公开号:US05391749A1
公开(公告)日:1995-02-21
Substituted naphthacenediones of the formula I ##STR1## in which R.sup.1 to R.sup.8 are H and at least one of R.sup.1 to R.sup.8, for example R.sup.2 and R.sup.3 or R.sup.2 and R.sup.6, are, for example, C.sub.1 -C.sub.20 alkoxy, C.sub.1 -C.sub.20 alkenoxy, C.sub.1 -C.sub.20 -alkylsulfinyl, --CN, --CF.sub.3, --NO.sub.2, --Si(CH.sub.3).sub.3 or --COO(C.sub.1 -C.sub.12 alkyl), are suitable, when incorporated into polymers having hydroxyalkyl groups, for currentless deposition of metals onto the polymer surface. They are in some cases suitable as photoinitiators.
公式I中的取代萘并二酮 ##STR1## 其中R.sup.1到R.sup.8为氢,且至少其中一个R.sup.1到R.sup.8(例如R.sup.2和R.sup.3或R.sup.2和R.sup.6)为C.sub.1-C.sub.20烷氧基,C.sub.1-C.sub.20烯氧基,C.sub.1-C.sub.20烷基磺酰基,--CN,--CF.sub.3,--NO.sub.2,--Si(CH.sub.3).sub.3或--COO(C.sub.1-C.sub.12烷基)。当它们被合并到具有羟基烷基的聚合物中时,它们适用于在聚合物表面上进行无电流沉积金属。在某些情况下,它们适用作为光引发剂。