1,3-bis(methoxymethyl)-5-(hydroxymethyl)benzene | 1036273-00-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,3-bis(methoxymethyl)-5-(hydroxymethyl)benzene
• 英文别名: [3,5-Bis(methoxymethyl)phenyl]methanol；[3,5-bis(methoxymethyl)phenyl]methanol
• CAS: 1036273-00-3
• 化学式: C₁₁H₁₆O₃
• 分子量: 196.246
• InChiKey: OSMCLNXDOFYJQC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  38.7
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  1,3-bis(methoxymethyl)-5-(hydroxymethyl)benzene 在 四溴化碳 、 三苯基膦 作用下， 以 四氢呋喃 为溶剂， 反应 1.5h， 以79%的产率得到1,3-bis(methoxymethyl)-5-(bromomethyl)benzene
  参考文献：
  名称：

  Synthesis and CD spectroscopy of polyethers with homochiral and heterochiral layers of stereocentres

  摘要：

  Eight polyethers with three to nine stereocentres have been synthesised using chiral base methodology. Examination of the polyethers by CD spectroscopy revealed clear differences between homochiral isomers and isorners with a heterochiral relationship between an 'inner' layer of stereocentres and an outer' layer of stereocentres. A hypothesis to account for these differences has been advanced. (C) 2008 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2008.05.028
• 作为产物：
  描述：

  1-(triisopropylsilyloxymethyl)-3,5-dimethoxymethylbenzene 在 四丁基氟化铵 作用下， 以 四氢呋喃 为溶剂， 反应 3.0h， 以88%的产率得到1,3-bis(methoxymethyl)-5-(hydroxymethyl)benzene
  参考文献：
  名称：

  Synthesis and CD spectroscopy of polyethers with homochiral and heterochiral layers of stereocentres

  摘要：

  Eight polyethers with three to nine stereocentres have been synthesised using chiral base methodology. Examination of the polyethers by CD spectroscopy revealed clear differences between homochiral isomers and isorners with a heterochiral relationship between an 'inner' layer of stereocentres and an outer' layer of stereocentres. A hypothesis to account for these differences has been advanced. (C) 2008 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2008.05.028

文献信息

• [EN] ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AU RAYON ACTINIQUE OU AU RAYONNEMENT, FILM SENSIBLE AU RAYON ACTINIQUE OU AU RAYONNEMENT, ÉBAUCHE DE MASQUE ET PROCÉDÉ DE FORMATION D'UN MOTIF
  申请人：FUJIFILM CORP

  公开号：WO2013069812A1

  公开（公告）日：2013-05-16

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
• Synthesis and CD spectroscopy of polyethers with homochiral and heterochiral layers of stereocentres
  作者：Alice R.E. Brewer、Alex F. Drake、Susan E. Gibson、Jacob T. Rendell

  DOI：10.1016/j.tet.2008.05.028

  日期：2008.7

  Eight polyethers with three to nine stereocentres have been synthesised using chiral base methodology. Examination of the polyethers by CD spectroscopy revealed clear differences between homochiral isomers and isorners with a heterochiral relationship between an 'inner' layer of stereocentres and an outer' layer of stereocentres. A hypothesis to account for these differences has been advanced. (C) 2008 Elsevier Ltd. All rights reserved.