2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,12,18,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15(26),16,18,21,23-dodecaene-4,10,16,24-tetrol | 1309964-90-6

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,12,18,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15(26),16,18,21,23-dodecaene-4,10,16,24-tetrol
• 英文别名: 2,8,14,20-tetrakis(4-hydroxyphenyl)-6,12,18,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15(26),16,18,21,23-dodecaene-4,10,16,24-tetrol
• CAS: 1309964-90-6
• 化学式: C₈₀H₈₈O₁₂
• 分子量: 1241.57
• InChiKey: YMOZDEGCQHHITM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  18.8
• 重原子数：
  92
• 可旋转键数：
  12
• 环数：
  13.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  199
• 氢给体数：
  8
• 氢受体数：
  12

反应信息

• 作为产物：
  描述：

  3-(4-methylcyclohexyloxy)phenol 、 对羟基苯甲醛 在 盐酸 作用下， 以 乙醇 、 水 为溶剂， 反应 5.0h， 生成 2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,12,18,24-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(24),3(28),4,6,9(27),10,12,15(26),16,18,21(25),22-dodecaene-4,10,16,22-tetrol 、 2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,12,16,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,10,18,24-tetrol 、 2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,12,18,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15(26),16,18,21,23-dodecaene-4,10,16,24-tetrol 、 2,8,14,20-Tetrakis(4-hydroxyphenyl)-6,10,18,22-tetrakis[(4-methylcyclohexyl)oxy]pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9,11,13(27),15(26),16,18,21,23-dodecaene-4,12,16,24-tetrol
  参考文献：
  名称：

  CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD

  摘要：

  公开号：

  EP2505576B1

文献信息

• CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Takasuka Masaaki

  公开号：US20120282546A1

  公开（公告）日：2012-11-08

  Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

  本发明涉及一种具有高溶解度、高灵敏度、能够形成良好形状的抗蚀图案，且很少引起抗蚀图案崩塌的环状化合物；一种制备该环状化合物的方法；一种含有该环状化合物的辐射敏感组合物；以及使用该组合物的抗蚀图案形成方法。具体揭示了一种具有特定结构的环状化合物，制备该环状化合物的方法，含有该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• US8969629B2
  申请人：——

  公开号：US8969629B2

  公开（公告）日：2015-03-03
• CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2505576B1

  公开（公告）日：2019-04-24