tert-butyl cholate | 122752-67-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 类固醇和类固醇衍生物
• 英文名称: tert-butyl cholate
• 英文别名: t-butyl cholate；(3alpha,5beta,7alpha,12alpha)-3,7,12-Trihydroxy-cholan-24-oic acid 1,1-dimethylethyl ester；tert-butyl (4R)-4-[(3R,5S,7R,8R,9S,10S,12S,13R,14S,17R)-3,7,12-trihydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1H-cyclopenta[a]phenanthren-17-yl]pentanoate
• CAS: 122752-67-4
• 化学式: C₂₈H₄₈O₅
• 分子量: 464.686
• InChiKey: GPAXVIDICNEZAM-XBOGZSQZSA-N

物化性质

• 沸点：
  566.3±50.0 °C(Predicted)
• 密度：
  1.106±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.9
• 重原子数：
  33
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.96
• 拓扑面积：
  87
• 氢给体数：
  3
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  tert-butyl cholate 在 4-二甲氨基吡啶 氢氧化钾 、 盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺 作用下， 以 四氢呋喃 、 甲醇 、 水 为溶剂， 反应 0.24h， 生成 N-(3Alpha,7Alpha,12Alpha)三羟基-5β-胆甾烷-24-酰基牛黄酸
  参考文献：
  名称：

  Chemical modifications of bile acids under high-intensity ultrasound or microwave irradiation

  摘要：

  High-intensity ultrasound (HIU) and microwave (MW) irradiation, having emerged as effective promoters of organic reactions, were exploited for the synthesis of bile acids derivatives. Esterification, amidation, hydrolysis, oxidation, and reduction were investigated. Compared to conventional methods, both techniques proved much more efficient, increasing product yields and dramatically cutting down reaction times. Scaled-up studies are now under way. (C) 2004 Elsevier Inc. All rights reserved.

  DOI：

  10.1016/j.steroids.2004.09.007
• 作为产物：
  描述：

  胆酸 、 叔丁醇 在 三氟乙酸酐 作用下， 以 四氢呋喃 为溶剂， 反应 8.5h， 以92%的产率得到tert-butyl cholate
  参考文献：
  名称：

  具有高热稳定性和动力学稳定性的化学锁定Bicelles

  摘要：

  由磷脂和可聚合表面活性剂组成的双孔混合物的原位聚合提供了前所未有的稳定双孔。聚合的复合材料在宽广的温度范围内（25至> 90°C）显示出取向相，并且溶剂信号具有出色的2 H四极分裂，因此暗示了其作为NMR研究的取向介质的多功能性。表面活性剂的交联还对双电池的动力学稳定性和排列形态带来了有利的影响。因此，该系统可以为生物膜模型提供一类新的支架。

  DOI：

  10.1002/anie.201506781

文献信息

• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20090246694A1

  公开（公告）日：2009-10-01

  Photoacid generators generate sulfonic acids of formula ( 1 a) upon exposure to high-energy radiation. ROC(═O)R 1 —COOCH 2 CF 2 SO 3 − H + (1a) RO is OH or C 1 -C 20 organoxy, R 1 is a divalent C 1 -C 20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）的磺酸。 ROC(═O)R1—COOCH2CF2SO3−H+(1a) RO为OH或C1-C20有机氧基，R1为二价的C1-C20脂肪族基团或与RO形成环状结构。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物的使用。
• Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
  申请人：DiPietro A. Richard

  公开号：US20060287558A1

  公开（公告）日：2006-12-21

  Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R 1 , R 2 , R 3 , R 4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。
• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20090061358A1

  公开（公告）日：2009-03-05

  Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. R 1 —COOCH(CF 3 )CF 2 SO 3 + H + (1a) R 1 —O—COOCH(CF 3 )CF 2 SO 3 − H + (1c) R 1 is a C 20 -C 50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）或（1c）的磺酸。R1—COOCH(CF3)CF2SO3+H+(1a)R1—O—COOCH(CF3)CF2SO3−H+(1c)R1是具有类固醇结构的C20-C50烃基。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物的使用。
• Novel photoacid generators, resist compositions, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20080085469A1

  公开（公告）日：2008-04-10

  Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. RC(═O)R 1 —COOCH(CF 3 )CF 2 SO 3 − H + (1a) R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R 1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R 1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）的磺酸。RC(═O)R1—COOCH(CF3)CF2SO3−H+(1a)中，R为羟基、烷基、芳基、杂芳基、烷氧基、芳氧基或杂芳氧基，R1为可能含有杂原子（O、N或S）取代基的二价有机基团，或R1可与R形成环状结构。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物中的使用。
• Modified bile acids process for their preparation and their use
  申请人：Hoechst Aktiengesellschaft

  公开号：US05641767A1

  公开（公告）日：1997-06-24

  The invention relates to linker-modified bile acid derivatives of the formula I: ##STR1## wherein the radicals X.sup.1, X.sup.2, X.sup.3 and Y and n are as defined in the claims, and to a process for their preparation. The compounds according to the invention are therapeutically active and are thus suitable as drugs, especially as hypolipldemics. The invention further relates to the use of the bile acid derivatives according to the invention as drugs.

  本发明涉及公式I的连接物修饰的胆酸衍生物：##STR1## 其中基团X^1、X^2、X^3和Y以及n如权利要求中定义的，并且涉及其制备方法。根据本发明的化合物具有治疗活性，因此适用作药物，尤其是作为降脂药物。本发明还涉及根据本发明的胆酸衍生物作为药物的用途。