Sustainable Radical Cascades to Synthesize Difluoroalkylated Pyrrolo[1,2-<i>a</i>]indoles
作者:Honggui Huang、Menglin Yu、Xiaolong Su、Peng Guo、Jia Zhao、Jiabing Zhou、Yi Li
DOI:10.1021/acs.joc.7b03017
日期:2018.2.16
We disclose herein a photocatalytic difluoroalkylation and cyclization cascade reaction of N-(but-2-enoyl)indoles with broad substrate scopes in up to 90% isolated yield. This method provides sustainable and efficient access to synthesize difluoroalkylated pyrrolo[1,2-a]indoles with a quaternary carbon center under mild conditions.
我们在此公开了N-(丁-2-烯酰基)吲哚具有宽的底物范围的光催化二氟烷基化和环化级联反应,其分离产率高达90%。该方法提供了在温和条件下可持续有效地合成具有季碳中心的二氟烷基化吡咯并[1,2- a ]吲哚的方法。
Sustainable Cascades to Difluoroalkylated Polycyclic Imidazoles
作者:Sheng‐Nan Lin、Yu Chen、Xiao‐Dong Luo、Yi Li
DOI:10.1002/ejoc.202100868
日期:2021.8.20
synthesis of imidazoles from alkenes is described here. Series of highly functionalized polycyclic imidazoles were prepared efficiently with 0.01 equiv. of fac-Ir(ppy)3 as photocatalyst under the irradiation of 3 W blue LEDs. This method is characterized by a wide substrate scope with up to 95 % isolated yield under mild conditions. Mechanistic studies indicated a photocatalyzed direct radical difluoroalkylated
Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt
申请人:Jodry Jonathan Joachim
公开号:US20110015431A1
公开(公告)日:2011-01-20
Disclosed is a process for producing 2-bromo-2,2-difluoroethanol, which comprises reducing a bromodifluoroacetic acid derivative represented by the formula [1] by using an ate hydride complex as a reducing agent. 2-Bromo-2,2-difluoroethanol thus produced can be used as the starting material to carry out the esterification step, the sulfination step and the oxidation step in this order, thereby producing a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid salt, wherein A represents a substituted or unsubstituted linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, a substituted or unsubstituted aryloxy group having 6 to 15 carbon atoms, a heteroaryloxy group having 4 to 15 carbon atoms, or a halogen atom.
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
申请人:ASANO Yuusuke
公开号:US20120237875A1
公开(公告)日:2012-09-20
A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R
1
represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—
#
or —SO
2
—O—
##
, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R
1
.
-A-R
1
(x)
Photoredox-catalyzed allylation of α-gem-difluorinated organohalides with allylsulfones proceeded smoothly under visible light irradiation to give 4,4-difluoroalkenes in good yields. In the presence of catalytic Ru(bpy)3Cl2, Hantzsch ester, and diisopropylethylamine, the reaction was complete within 2 h. Using the same methodology, three-component cascade reactions to give 6,6-difluoroalkenes were