thiosulfuric acid S-(2-amino-phenyl) ester | 26306-57-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: thiosulfuric acid S-(2-amino-phenyl) ester
• 英文别名: thiosulfuric acid S-(2-amino-phenyl ester)；Thioschwefelsaeure-S-(2-amino-phenylester)；S-(2-Amino-phenyl)-thioschwefelsaeure；Anilin-o-thiosulfonsaeure；saures S-(2-Amino-phenyl)-thiosulfat；1-Amino-2-sulfosulfanylbenzene
• CAS: 26306-57-0
• 化学式: C₆H₇NO₃S₂
• 分子量: 205.258
• InChiKey: GRHRFSQQDQENDY-UHFFFAOYSA-N

物化性质

• 熔点：
  189-190 °C
• 密度：
  1?+-.0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  114
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  thiosulfuric acid S-(2-amino-phenyl) ester 生成 1,2,3-苯并噻二唑
  参考文献：
  名称：

  DE120504

  摘要：

  公开号：
• 作为产物：
  描述：

  双(2-氨基苯基)二硫 在 亚硫酸 作用下， 生成 thiosulfuric acid S-(2-amino-phenyl) ester
  参考文献：
  名称：

  SOME NEW METHODS FOR PREPARING BUNTE SALTS

  摘要：

  DOI：

  10.1021/jo01122a010

文献信息

• POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
  申请人：SEKISUI CHEMICAL CO., LTD.

  公开号：EP1270608A1

  公开（公告）日：2003-01-02

  The present invention has an object    to provide a polyvinyl acetal resin for heat-developable photosensitive materials as well as a heat-developable photosensitive material while solving such problems as coating solution pot life, coloration of heat-developable photosensitive material, fog, poor gradation, insufficient sensitivity and poor undeveloped film storability and making it possible for the materials to acquire good image characteristics. The present invention is constituted of a polyvinyl acetal resin for heat-developable photosensitive materials    which is a polyvinyl acetal resin synthesized by the acetalization reaction between a polyvinyl alcohol and an aldehyde and    which comprises having a degree of polymerization of 200 to 3, 000, a residual acetyl group content of 0 to 25 mole percent and a residual hydroxyl group content of 17 to 35 mole percent, as calculated while regarding one acetal group as two acetalized hydroxyl groups, a water content of not more than 2.5% by weight and a residual aldehyde content of not more than 10 ppm and is free of any antioxidant.

  本发明的目的是 提供一种用于热显影感光材料的聚乙烯醇缩醛树脂以及一种热显影感光材料，同时解决涂层溶液的罐装寿命、热显影感光材料的着色、雾化、色阶差、感光度不足和未显影胶片的耐储存性差等问题，并使材料获得良好的图像特性成为可能。 本发明由用于热显影感光材料的聚乙烯醇缩醛树脂构成 它是由聚乙烯醇和醛之间的缩醛反应合成的聚乙烯醇缩醛树脂，并且 其聚合度为 200 至 3,000，残余乙酰基含量为 0 至 25 摩尔%，残余羟基含量为 17 至 35 摩尔%（计算时将一个缩醛基视为两个缩醛羟基），水含量不超过 2.5%（重量百分比），残余醛含量不超过 10 ppm，且不含任何抗氧化剂。
• Polyvinyl acetal resin for heat -developable photosensitive material and heat-developable photosenstive material
  申请人：——

  公开号：US20030109636A1

  公开（公告）日：2003-06-12

  The present invention has an object of the present invention to provide a polyvinyl acetal resin for heat-developable photosensitive materials as well as a heat-developable photosensitive material while solving such problems as coating solution pot life, coloration of heat-developable photosensitive material, fog, poor gradation, insufficient sensitivity and poor undeveloped film storability and making it possible for the materials to acquire good image characteristics. The present invention is constituted of a polyvinyl acetal resin for heat-developable photosensitive materials which is a polyvinyl acetal resin synthesized by the acetalization reaction between a polyvinyl alcohol and an aldehyde and which comprises having a degree of polymerization of 200 to 3,000, a residual acetyl group content of 0 to 25 mole percent and a residual hydroxyl group content of 17 to 35 mole percent, as calculated while regarding one acetal group as two acetalized hydroxyl groups, a water content of not more than 2.5% by weight and a residual aldehyde content of not more than 10 ppm and is free of any antioxidant.

  本发明的目的是提供一种用于热显影感光材料的聚乙烯醇缩醛树脂以及一种热显影感光材料，同时解决涂布液的罐装寿命、热显影感光材料的着色、雾化、层次感差、感光度不够和未显影胶片的可储存性差等问题，并使材料获得良好的图像特性成为可能。 本发明由用于热显影感光材料的聚乙烯醇缩醛树脂构成 它是由聚乙烯醇和醛之间的缩醛反应合成的聚乙烯醇缩醛树脂，并且 其聚合度为 200 至 3,000，残余乙酰基含量为 0 至 25 摩尔%，残余羟基含量为 17 至 35 摩尔%（以一个缩醛基为两个缩醛羟基计算），水含量不超过 2.5%（重量百分比），残余醛含量不超过 10 ppm，且不含任何抗氧化剂。
• Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material
  申请人：SEKISUI CHEMICAL CO., LTD.

  公开号：US20040166449A1

  公开（公告）日：2004-08-26

  The present invention has an object of the present invention to provide a polyvinyl acetal resin for heat-developable photosensitive materials as well as a heat-developable photosensitive material while solving such problems as coating solution pot life, coloration of heat-developable photosensitive material, fog, poor gradation, insufficient sensitivity and poor undeveloped film storability and making it possible for the materials to acquire good image characteristics. The present invention is constituted of a polyvinyl acetal resin for heat-developable photosensitive materials which is a polyvinyl acetal resin synthesized by the acetalization reaction between a polyvinyl alcohol and an aldehyde and which comprises having a degree of polymerization of 200 to 3,000, a residual acetyl group content of 0 to 25 mole percent and a residual hydroxyl group content of 17 to 35 mole percent, as calculated while regarding one acetal group as two acetalized hydroxyl groups, a water content of not more than 2.5% by weight and a residual aldehyde content of not more than 10 ppm and is free of any antioxidant.

  本发明的目的是提供一种用于热显影感光材料的聚乙烯醇缩醛树脂以及一种热显影感光材料，同时解决涂布液的罐装寿命、热显影感光材料的着色、雾化、层次感差、感光度不够和未显影胶片的可储存性差等问题，并使材料获得良好的图像特性成为可能。 本发明由用于热显影感光材料的聚乙烯醇缩醛树脂构成 它是由聚乙烯醇和醛之间的缩醛反应合成的聚乙烯醇缩醛树脂，并且 其聚合度为 200 至 3,000，残余乙酰基含量为 0 至 25 摩尔%，残余羟基含量为 17 至 35 摩尔%（以一个缩醛基为两个缩醛羟基计算），水含量不超过 2.5%（重量百分比），残余醛含量不超过 10 ppm，且不含任何抗氧化剂。
• 395. Cyclization products from amino-substituted Bunte salts
  作者：J. B. Caldwell、Brian Milligan、J. M. Swan

  DOI：10.1039/jr9630002097

  日期：——
• Oprean,I.; Schaefer,W., Justus Liebigs Annalen der Chemie, 1972, vol. 765, p. 1 - 7
  作者：Oprean,I.、Schaefer,W.

  DOI：——

  日期：——