Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.
基于具有烷基
配体的
锡离子描述了有机
金属辐射抗性组合物。其中一些组合物具有支链烷基
配体,以提供改善的图案对比度,同时保持高度的溶液稳定性。混合具有不同烷基
配体的化合物可以进一步改善图案。可以通过半间距不超过25纳米的高分辨率图案形成,线宽粗糙度不超过约4.5纳米。已开发了合成技术,允许形成具有非常低
金属污染的烷基
锡氧化物羟化物组合物。