Direct Formation of Reactive Alkynyltrichlorotins from 1-Alkynes, SnCl<sub>4</sub>, and Bu<sub>3</sub>N. A Mild Alkynylation Reagent of Aldehydes, Acetals, and Enones
A reagent system of 1-alkyne, SnCl4, and Bu3N alkynylates aldehydes, acetals, and enones under mild reaction conditions giving acetylenic alcohols, acetylenic ethers, and acetylenic ketones, respectively, in high yields. Alkynyltrichlorotins are shown to be the reactive species for these reactions.
Oxidative coupling of tetraalkynyltin with aldehydes leading to alkynyl ketones
作者:Andrey S. Levashov、Nicolai A. Aksenov、Inna V. Aksenova、Valeriy V. Konshin
DOI:10.1039/c7nj01376k
日期:——
The reaction of tetraalkynyltin with aldehydes was studied for the first time. The reaction was shown to proceed as a tandem process of nucleophilic addition of tin acetylide to aldehyde followed by Oppenauer-type oxidation of produced tin alcoholates, and may be used as a convenient one-pot approach to acetylenic ketones. The advantages and limitations of the proposed method are discussed.
Lewis acid promoted reaction of tetraalkynylstannanes with acyl chlorides: An effective approach towards alkynyl ketones
作者:Andrey S. Levashov、Dmitrii S. Buryi
DOI:10.1016/j.tetlet.2017.10.035
日期:2017.11
Tetraalkynylstannanes were found to be atom-economical nucleophilic reagents for the synthesis of α,β-acetylenic ketones. The scope and some limitations of the method are discussed.
发现四炔基锡烷是用于合成α,β-炔酮的原子经济的亲核试剂。讨论了该方法的范围和一些局限性。
Reaction of tetra(phenylethynyl)tin with aromatic aldehydes: A new one-pot method for the synthesis of α-acetylene ketones
作者:A. S. Levashov、D. S. Buryi、V. V. Konshin、V. V. Dotsenko、N. A. Aksenov、I. V. Aksenova
DOI:10.1134/s1070363217070295
日期:2017.7
The reaction of tetra(phenylethynyl)tin with aromaticaldehydes in the presence of ZnCl2 afforded α-acetylene ketones in a yield of 77–98%.
四(苯基乙炔基)锡与ZnCl 2存在下的芳族醛反应生成α-乙炔酮,产率为77-98%。
[EN] ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS<br/>[FR] COMPOSITIONS POUR LA FORMATION DE MOTIFS À HAUTE RÉSOLUTION À BASE DE SOLUTIONS ORGANOMÉTALLIQUES ET PROCÉDÉS CORRESPONDANTS
申请人:INPRIA CORP
公开号:WO2016065120A1
公开(公告)日:2016-04-28
Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.