1-[9]anthryl-butan-1-ol | 101789-10-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1-[9]anthryl-butan-1-ol
• 英文别名: 1-Anthracen-9-ylbutan-1-ol；1-anthracen-9-ylbutan-1-ol
• CAS: 101789-10-0
• 化学式: C₁₈H₁₈O
• 分子量: 250.34
• InChiKey: WKPAQSANSUBRAB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  19
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  蒽 在 lithium aluminium tetrahydride 、 三氯化铝 、 乙醚 作用下， 生成 1-[9]anthryl-butan-1-ol
  参考文献：
  名称：

  Lalande; Calas, Bulletin de la Societe Chimique de France, 1959, p. 766

  摘要：

  DOI：

文献信息

• Spin-on-glass anti-reflective coatings for photolithography
  申请人：——

  公开号：US20020095018A1

  公开（公告）日：2002-07-18

  Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

  用于紫外光刻的防反射涂层材料包括至少一种有机吸光化合物，它被纳入旋涂玻璃材料中。适合的吸收化合物可以在365 nm、248 nm、193 nm和157 nm等可能用于光刻的波长范围内强烈吸收。制备吸收性旋涂玻璃材料的方法包括在旋涂玻璃材料的合成过程中将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物结合。
• Spin-on anti-reflective coatings for photolithography
  申请人：Kennedy T Joseph

  公开号：US20050058929A1

  公开（公告）日：2005-03-17

  Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

  紫外光微影用的防反射涂层材料包括至少一个吸收化合物和至少一个pH调节剂，它们被并入旋涂材料中。适合的吸收化合物是那些在光刻中使用的波长范围内吸收的化合物，如365 nm、248 nm、193 nm和157 nm。适合的pH调节剂不仅可以调节最终旋涂组合物的pH值，还可以影响最终旋涂组合物的化学性能和特性、机械性能和结构构成，使最终的旋涂组合物更加兼容与其耦合的抗蚀材料、电子元件或半导体元件。更具体地说，pH调节剂强烈影响聚合物特性、结构构成和空间取向，从而增加防反射涂层的表面性能，以实现最佳的抗蚀性能。换句话说，仅仅调节旋涂材料的pH值而不影响旋涂组合物或耦合抗蚀材料的机械性能和结构构成的pH调节剂不在此范围内。制备吸收和pH调节旋涂材料的方法包括在旋涂材料和组合物的合成过程中将至少一个有机吸收化合物和至少一个pH调节剂与至少一个硅烷反应物结合。
• Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
  申请人：Kennedy Joseph

  公开号：US20080206690A1

  公开（公告）日：2008-08-28

  Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.

  本文描述了用于三层应用的组合物，其中该组合物具有一个基质，包括：一种经过配制的聚合物，该聚合物的基质包含至少一种硅基基团，与基质相偶联的多个乙烯基和多个苯基，至少一种缩合催化剂和至少一种溶剂。本文还考虑了三层结构，包括有机底层（第一层）、反射率组合物和/或膜（第二层）以及与其相偶联的光阻材料（第三层）。制备用于三层图案应用的组合物的方法包括：提供一种经过配制的聚合物，该聚合物的基质包括至少一种硅基基团，与基质相偶联的多个乙烯基和多个苯基，提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将经过配制的聚合物和至少一部分溶剂混合在反应容器中形成反应混合物；并将至少一种pH调节剂、至少一种缩合催化剂和剩余的至少一种溶剂混入反应混合物中形成组合物。
• Spin-On Anti-Reflective Coatings for Photolithography
  申请人：Honeywell International Inc.

  公开号：US20130164677A1

  公开（公告）日：2013-06-27

  Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

  紫外光微影的抗反射涂层材料包括至少一种吸收化合物和至少一种pH调节剂，它们被纳入到旋涂材料中。适合的吸收化合物是那些在365纳米、248纳米、193纳米和157纳米左右吸收的化合物，可用于光刻技术。适合的pH调节剂不仅可以调节最终旋涂组合物的pH值，还可以影响最终旋涂组合物的化学性能和特性、机械性能和结构组成，使最终旋涂组合物与与之耦合的抗性材料更加兼容。制备吸收和pH调节旋涂材料的方法包括在旋涂材料和组合物的合成过程中，将至少一种有机吸收化合物和至少一种pH调节剂与至少一种硅烷反应物结合。
• Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof
  申请人：Baldwin Teresa

  公开号：US20140227538A1

  公开（公告）日：2014-08-14

  Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds

  用于紫外光刻的防反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种多孔剂、至少一种高沸点溶剂、至少一种封顶剂、至少一种平整剂、至少一种催化剂、至少一种替代溶剂、至少一种pH调节剂和/或它们的组合，这些材料被纳入无机基材料或无机组合物和/或化合物中。适合的吸收化合物