申请人:Clariant International Ltd.
公开号:EP0922998A1
公开(公告)日:1999-06-16
A radiation sensitive resist composition with high sensitivity, capable of forming a highly heat-resistant resist pattern. The radiation-sensitive resist composition contains, together with a resist material, a polymer which is obtained by reacting (a) a xylylene compound, (b) salicylic acid and (c) 9,9'-bis(hydroxyphenyl)fluorene derivatives or diol compounds of 3,3,3',3'-tetramethyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene, and which has a weight average molecular weight of 1,000 to 5,000 and Tg of 100 to 150 °C . Examples of (c) include 9,9'-bis(4-hydroxyphenyl)fluorene and 3,3,3',3'-tetramathyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene-6,6'-diol. As the resist material, any of positive- and negative-working resists may be used, with that comprising an alkali-soluble resin and a quinonediazide photo-sensitizer being preferably used.
一种具有高灵敏度的辐射敏感抗蚀剂组合物,能够形成高度耐热的抗蚀图案。辐照敏感抗蚀剂组合物与抗蚀剂材料一起含有一种聚合物,这种聚合物是通过(a)二甲苯化合物、(b)水杨酸和(c)9,9'-双(羟基苯基)芴衍生物或 3,3,3',3'-四甲基-2,3,2',3'-四氢-(1,1')-螺双茚的二元醇化合物反应得到的,其重量平均分子量为 1,000 至 5,000,Tg 为 100 至 150 °C。(c)的例子包括 9,9'-双(4-羟基苯基)芴和 3,3,3',3'-四甲基-2,3,2',3'-四氢-(1,1')-螺生物茚-6,6'-二醇。作为抗蚀剂材料,可使用任何正作和负作抗蚀剂,最好使用由碱溶性树脂和醌噻嗪类光敏剂组成的抗蚀剂。