2,6-Bis-(4-hydroxy-benzyl)-4-methyl-phenol | 172210-41-2

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,6-Bis-(4-hydroxy-benzyl)-4-methyl-phenol
• 英文别名: 4-Hydroxy-1-methyl-3,5-bis-(4-hydroxy-benzyl)-benzol；4-Oxy-3.5-bis-(4-oxy-benzyl)-toluol；2.6-Bis-(4-oxy-benzyl)-p-kresol；2,6-Bis-(4-oxy-benzyl)-p-kresol；2,6-bis[(4-hydroxyphenyl)methyl]-4-methylphenol
• CAS: 172210-41-2
• 化学式: C₂₁H₂₀O₃
• 分子量: 320.388
• InChiKey: CEHDSLDFUCVNKA-UHFFFAOYSA-N

物化性质

• 熔点：
  213-214 °C
• 沸点：
  535.5±45.0 °C(Predicted)
• 密度：
  1.233±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2,6-Bis-(4-hydroxy-benzyl)-4-methyl-phenol 在 溴 作用下， 生成 2,6-bis-(3,5-dibromo-4-hydroxy-benzyl)-4-methyl-phenol
  参考文献：
  名称：

  Pochwalski; Zowall, Roczniki Chemii, 1955, vol. 29, p. 55,59

  摘要：

  DOI：
• 作为产物：
  描述：

  2,6-dibromo-4-bromomethyl-phenol 在 乙醇 、 sodium 作用下， 生成 2,6-Bis-(4-hydroxy-benzyl)-4-methyl-phenol
  参考文献：
  名称：

  Auwers; Rietz, Chemische Berichte, 1905, vol. 38, p. 3306

  摘要：

  DOI：

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130029255A1

  公开（公告）日：2013-01-31

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1). (in the formula, each of R 11 and R 12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X 11 represents an aryl group; M 11 represents a single bond or a divalent linking group; and Q 11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M 11 -Q 11 is 3 or more, and at least two of R 11 , R 12 , Q 11 , and X 11 may form a ring by bonding to each other)

  提供的是一种感光树脂组合物，其中包含至少含有一个酚羟基和至少一个氢原子被以下通式（1）所代表的基替换的基团的化合物（A）。（在通式中，R11和R12分别独立地表示氢原子、烷基、环烷基、芳基或芳基烷基；X11表示芳基；M11表示单键或二价连接基团；Q11表示烷基、环烷基或芳基，其中包含在-M11-Q11所代表的基团中的碳原子数为3或更多，并且R11、R12、Q11和X11中至少有两个可以通过相互键合形成环）
• PROCESSES FOR PREPARING CURED FILMS, THE RESULTING FILMS, AND PLASMA-INITIATED POLYMERIZABLE COMPOSITIONS
  申请人：FUJIFILM Corporation

  公开号：US20140170405A1

  公开（公告）日：2014-06-19

  Provided are novel plasma-assisted processes for preparing cured films having excellent heat resistance and moisture resistance. A process for preparing a cured film, comprising at least: applying a composition containing (A) at least one conductive polymer precursor on a substrate to form a coating layer, and irradiating the coating layer with a plasma to polymerize the conductive polymer precursor (A).

  提供了一种新型等离子体辅助制备固化膜的工艺，该固化膜具有优异的耐热性和耐潮性。一种制备固化膜的工艺，包括至少以下步骤：在基板上涂布含有（A）至少一种导电聚合物前体的组合物以形成涂层层，然后用等离子体照射涂层层以聚合导电聚合物前体（A）。
• Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0745575A1

  公开（公告）日：1996-12-04

  Provided are a method of synthesizing a highly pure polyphenol compound, which comprises (i) introducing at least one -CHRNR'R'' group onto aromatic ring(s) of a phenol compound having from one to ten aromatic ring(s), wherein R represents a hydrogen atom, an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'', which may be the same or different, each represents an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'' may combine with each other to form a ring, (ii) converting the -CHRNR'R'' group into a -CHRA group via one to three steps, wherein A represents a hydroxyl group, an alkoxy group, an acyloxy group, a halogen atom, a quaternary ammonium salt or a sulfonyloxy group, and (iii) condensing the thus converted phenol compound and a phenol compound, and a positive working photoresist composition using the polyphenol compound obtained by the aforementioned method.

  本发明提供了一种合成高纯度多酚化合物的方法，该方法包括(i)在具有一至十个芳香环的苯酚化合物的芳香环上引入至少一个-CHRNR'R''基团，其中 R 代表氢原子、可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基，R'和 R''可以相同或不同，各自代表可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、(ii) 通过一至三个步骤将 -CHRNR'R'' 基团转化为 -CHRA 基团，其中 A 代表羟基、烷氧基、酰氧基、环烷基或芳基、烷氧基、酰氧基、卤素原子、季铵盐或磺酰氧基，以及 (iii) 将由此转化的苯酚化合物和苯酚化合物缩合，并使用通过上述方法获得的多酚化合物制备正性工作光刻胶组合物。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。