4-dodecyloxy-2,3,5,6-tetrafluorobenzenesulfonic acid | 852572-07-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-dodecyloxy-2,3,5,6-tetrafluorobenzenesulfonic acid
• 英文别名: 4-Dodecoxy-2,3,5,6-tetrafluorobenzenesulfonic acid
• CAS: 852572-07-7
• 化学式: C₁₈H₂₆F₄O₄S
• 分子量: 414.462
• InChiKey: RVVWEEHMUKQEBQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.6
• 重原子数：
  27
• 可旋转键数：
  13
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  72
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  aqueous 1M-sodium hydroxide 、 Methylpropanyl pentafluorobenzenesulfonic acid ester 、 十二烷醇 、 四丁基硫酸氢铵 生成 4-dodecyloxy-2,3,5,6-tetrafluorobenzenesulfonic acid
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
  申请人：Wada Kenji

  公开号：US20050123859A1

  公开（公告）日：2005-06-09

  A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

  一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；以及一种使用包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物的图案形成方法。
• CURABLE COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGE PICKUP ELEMENT, PICTURE DISPLAY DEVICE, AND TRIARYLMETHANE COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160185969A1

  公开（公告）日：2016-06-30

  Provided are a curable coloring composition which is useful for formation of a colored pattern of a color filter, having high heat resistance, excellent solvent resistance, and a high voltage holding ratio; a color filter; a method for manufacturing a color filter; a solid-state image pickup element; a picture display device; and a triarylmethane compound. The curable coloring composition includes a triarylmethane compound having a structure represented by the following General Formula (1) and a structure represented by the following General Formula (2) in the same molecule.

  提供了一种可治疗的着色组合物，适用于形成彩色滤光片的彩色图案，具有高耐热性、优异的溶剂抗性和高电压保持比率；一种彩色滤光片；一种制造彩色滤光片的方法；一种固态图像传感器元件；一种图片显示设备；以及一种三芳基甲烷化合物。该可治疗的着色组合物包括具有以下一般式（1）所表示的结构和同一分子中具有以下一般式（2）所表示的结构的三芳基甲烷化合物。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。
• Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
  申请人：Kawanishi Yasutomo

  公开号：US20060194147A1

  公开（公告）日：2006-08-31

  The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R 1 represents an alkyl group or an aryl group, R 2 to R 9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, X n− represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.

  该发明提供了一种用于半导体（例如IC）、液晶电路基板、热敏头等的制造工艺或其他光刻制造工艺中使用的抗蚀剂组成物，以及用于该抗蚀剂组成物的化合物和图案形成方法。该抗蚀剂组成物包括以下式（I）所表示的磺酸盐（A）；以及使用该抗蚀剂组成物的图案形成方法：其中，R1表示烷基或芳基，R2至R9各自独立地表示氢原子或取代基，并且它们可以结合在一起形成环，Z表示电子吸引性双价连接基团，Xn-表示n价阴离子，n表示1至3的整数，m表示中和电荷所需的阴离子数。
• RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME
  申请人：Kamimura Sou

  公开号：US20080241737A1

  公开（公告）日：2008-10-02

  A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I): wherein: A represents an organic group not containing hetero atoms; and Y represents an organic group capable of releasing a radical.

  一种抗蚀性组合物包括（A）至少两种树脂，每种树脂通过酸的作用分解，以增加其对碱性显影剂的溶解度，其中至少一种树脂（A）是通过使用由式（I）表示的链转移剂合成的活性自由基聚合树脂：其中：A代表不含杂原子的有机基团；Y代表能够释放自由基的有机基团。