dicyclohexylcarbamic acid tert-butyl ester | 330576-56-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: dicyclohexylcarbamic acid tert-butyl ester
• 英文别名: N-(tert-butoxycarbonyl)-dicyclohexylamine；N-t-butoxycarbonyl dicyclohexylamine；Carbamic acid, dicyclohexyl-, 1,1-dimethylethyl ester；tert-butyl N,N-dicyclohexylcarbamate
• CAS: 330576-56-2
• 化学式: C₁₇H₃₁NO₂
• 分子量: 281.439
• InChiKey: WIURVMHVEPTKHB-UHFFFAOYSA-N

物化性质

• 熔点：
  58-59 °C
• 沸点：
  367.7±9.0 °C(Predicted)
• 密度：
  0.99±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.94
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  二碳酸二叔丁酯 、 二环己胺 在 rice-husk-supported FeCl₃ nano particles 作用下， 以 neat (no solvent) 为溶剂， 反应 3.7h， 以92%的产率得到dicyclohexylcarbamic acid tert-butyl ester
  参考文献：
  名称：

  稻壳：引入一种绿色、廉价且可重复使用的催化剂，用于保护醇、酚、胺和硫醇

  摘要：

  摘要 以稻壳 (RiH) 为原料，开发了一种温和、高效、环保的方案，用于化学选择性保护苄基和伯和受阻较小的仲脂肪醇和酚作为三甲基甲硅烷基醚以及不同类型的胺作为 N-叔丁基氨基甲酸酯。催化剂。该试剂还能够催化醇、酚、硫醇和胺与乙酸酐的乙酰化反应。该方法的显着特点是后处理简单、反应时间相对较短、收率高、成本低、催化剂的可用性和可重复使用性是该方法的显着特点，可被认为是保护醇、酚的最佳和通用方法之一、硫醇和胺。此外，

  DOI：

  10.1016/j.crci.2013.01.018

文献信息

• Preparation, characterization and application of succinimidinium hydrogensulfate ([H-Suc]HSO₄) as an efficient ionic liquid catalyst for the N-Boc protection of amines
  作者：Farhad Shirini、Omid Goli Jolodar、Mohadeseh Seddighi、Hojatollah Takbiri Borujeni

  DOI：10.1039/c4ra14130j

  日期：——

  Succinimidinium hydrogensulfate ([H-Suc]HSO₄), which is prepared from the reaction of succinimide and sulfuric acid, showed excellent catalytic activity for theN-Boc protection of various amines under solvent free conditions.

  琥珀酰亚胺硫酸氢盐([H-Suc]HSO4)，由琥珀酰亚胺和硫酸反应制备，在无溶剂条件下对各种胺的N-Boc保护显示了出色的催化活性。
• Indium(III) Halides as New and Highly Efficient Catalysts for <i>N</i>-<i>tert</i>-Butoxycarbonylation of Amines
  作者：Asit Chakraborti、Sunay Chankeshwara

  DOI：10.1055/s-2006-942492

  日期：2006.8

  Indium(III) bromide and chloride efficiently catalysed the N-tert-butoxycarbonylation of amines with (Boc)2O at room temperature and under solvent-free conditions. Various aromatic, heteroaromatic and aliphatic amines were converted to N-tert-butylcarbamates in excellent yields in short times. Chiral amines, esters of α-amino acids and β-amino alcohols afforded optically pure N-t-Boc derivatives in high yields. The reactions were chemoselective and no competitive side reactions such as isocyanate, urea, and N,N-di-t-Boc formation were observed. Chemoselective conversion to N-tert-butylcarbamates took place with amino alcohols without any formation of oxazolidinones.

  溴化铟(III)和氯化铟(III)在室温下以及无溶剂条件下有效地催化胺类与(Boc)2O的N-叔丁氧羰基化反应。多种芳香、杂芳香和脂肪胺类在短时间内高效转化为N-叔丁基氨基甲酸酯。手性胺、α-氨基酸酯和β-氨基醇在较高产率下得到光学纯的N-t-Boc衍生物。反应具有化学选择性，未观察到异氰酸酯、脲和N,N-二-t-Boc形成等竞争性副反应。氨基醇也能进行化学选择性转化为N-叔丁基氨基甲酸酯，而不形成噁唑烷酮。
• Resist composition and patterning process
  申请人：Watanabe Satoshi

  公开号：US20100009299A1

  公开（公告）日：2010-01-14

  The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F 2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

  本发明涉及一种抗蚀组合物，例如用于在抗蚀物的基板侧边界面上提供优异图案轮廓的化学增感抗蚀组合物，除了在微细加工的光刻工艺中具有更高的分辨率外，特别是在采用KrF激光、ArF激光、F2激光、超短紫外光、电子束、X射线等作为曝光光源的光刻工艺中；以及利用该抗蚀组合物的图案化工艺。本发明提供一种化学增感抗蚀组合物，其包括一种或多种胺化合物或胺氧化合物（除了那些在芳香环的环结构中不含有胺或胺氧原子的氮原子的化合物），至少具有一个羧基，并且没有氢原子共价键结合到氮原子作为碱性中心。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：NISHI Tsunehiro

  公开号：US20100062374A1

  公开（公告）日：2010-03-11

  A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R 1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。
• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20090246694A1

  公开（公告）日：2009-10-01

  Photoacid generators generate sulfonic acids of formula ( 1 a) upon exposure to high-energy radiation. ROC(═O)R 1 —COOCH 2 CF 2 SO 3 − H + (1a) RO is OH or C 1 -C 20 organoxy, R 1 is a divalent C 1 -C 20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）的磺酸。 ROC(═O)R1—COOCH2CF2SO3−H+(1a) RO为OH或C1-C20有机氧基，R1为二价的C1-C20脂肪族基团或与RO形成环状结构。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物的使用。