3-isopropyl-4-methyl-1H-pyrrole | 1051927-48-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯
• 英文名称: 3-isopropyl-4-methyl-1H-pyrrole
• 英文别名: 3-isopropyl-4-methyl-pyrrole；3-Isopropyl-4-methyl-pyrrol；3-methyl-4-propan-2-yl-1H-pyrrole
• CAS: 1051927-48-0
• 化学式: C₈H₁₃N
• mdl: MFCD19218970
• 分子量: 123.198
• InChiKey: ZNMAFEVYAMTWHX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  9
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  15.8
• 氢给体数：
  1
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  3-isopropyl-4-methyl-1H-pyrrole 生成 3-isopropyl-4-methyl-pyrrole-1-carboxylic acid anilide
  参考文献：
  名称：

  Miyasaki, Yakugaku Zasshi/Journal of the Pharmaceutical Society of Japan, 1955, vol. 75, p. 695,697

  摘要：

  DOI：
• 作为产物：
  描述：

  红藻氨酸 在 乙醚 作用下， 生成 3-isopropyl-4-methyl-1H-pyrrole
  参考文献：
  名称：

  Miyasaki, Yakugaku Zasshi/Journal of the Pharmaceutical Society of Japan, 1955, vol. 75, p. 695,697

  摘要：

  DOI：

文献信息

• BI-FUNCTIONAL PYRAZOLOPYRIDINE COMPOUNDS
  申请人：BAKER WILLIAM R.

  公开号：US20110275623A1

  公开（公告）日：2011-11-10

  This invention provides compounds of the formula: wherein X is wherein R 1 and R 2 together with the phenyl to which they are bound may form a bicyclic, fused heterocyclic ring and all other variables are as defined herein, their use in pulmonary inflammation or bronchoconstriction therapy and compositions comprising and processes for preparing the same are provided.

  这项发明提供了以下式的化合物： 其中X是 其中R 1 和R 2 与它们结合的苯基一起可以形成一个双环融合的杂环环，所有其他变量如本文所定义，提供它们在肺部炎症或支气管痉挛治疗中的用途，以及包含它们的组合物和制备它们的方法。
• New Open-Chain Tetrapyrroles as Chromophores in the Plant Photoreceptor Phytochrome
  作者：Uwe Robben、Ingo Lindner、Wolfgang Gärtner

  DOI：10.1021/ja076728y

  日期：2008.8.27

  and isopropyl, methyl and tert-butyl, ethyl and methyl, vinyl and methyl, and isopropyl and methyl substituents have been generated. All novel chromophores assemble with the apoprotein. The obtained chromoproteins show hypsochromic shifts of the absorbance maxima by 10 nm maximally, compared to the native pigment, except for the 17-isopropyl-18-methyl-substituted compound which showed a 100 nm hypsochromic

  一系列六个开链四吡咯已被合成并用作植物光感受器蛋白光敏色素的发色团。新的发色团在环 D 的取代基 17 和 18 的大小不同。该环在光激发时会发生最大的构象变化（Z --> E 15,16-双键的光异构化）。已生成二甲基、甲基和异丙基、甲基和叔丁基、乙基和甲基、乙烯基和甲基以及异丙基和甲基取代基，而不是天然生色团植物色素中存在的甲基和乙烯基取代基（17、18 位）。所有新型生色团都与脱辅基蛋白组装。与天然色素相比，所获得的色蛋白的吸光度最大值最大为 10 nm，除了 17-异丙基-18-甲基取代的化合物显示出 100 nm 的选择性 P r 形式的红移。组装动力学随着取代基尺寸的增加而减慢，对 17 位改性取代基的影响更强。 18-异丙基和 18-叔丁基取代基的光诱导 P fr 形式的热稳定性甚至更高比原生颜料要好。那些在第 17 位带有比甲基（乙基和异丙基）大的取代基的发色团显示出各自 P
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• BI-FUNCTIONAL QUINOLINE ANALOGS
  申请人：Baker William R.

  公开号：US20130012504A1

  公开（公告）日：2013-01-10

  Provided are compounds of Formula I: R 1 and R 2 together with the phenyl to which they are bound may form a bicyclic, fused heterocyclic ring, and all other variables are as defined herein, as well as their use in treating pulmonary inflammation or bronchoconstriction and compositions comprising and processes for preparing the same.

  提供的是I式化合物：其中R1和R2与它们所连接的苯基可以形成一个双环融合的杂环环，而其他所有变量的定义如本文所述。此外，还提供了它们用于治疗肺部炎症或支气管收缩以及包含它们的组合物和制备它们的过程。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11022880B2

  公开（公告）日：2021-06-01

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学放大正型感光树脂组合物，能够抑制非抗蚀部分出现底部（靠近支撑物表面的一面）宽度比顶部（靠近抗蚀层表面的一面）宽度窄的 "起脚 "现象；以及当使用该感光树脂组合物在基底的金属表面上形成作为电镀物品模板的抗蚀图案时产生显影残留物。感光树脂组合物中含有一种具有特定结构的巯基化合物，它包括一种在受到照射的活性射线或辐射时产生酸的酸发生器，以及一种在酸的作用下其碱溶解度增加的树脂。