1-isopropenyl-4-(methoxymethoxy)benzene | 156184-01-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-isopropenyl-4-(methoxymethoxy)benzene
• 英文别名: 1-(Methoxymethoxy)-4-prop-1-en-2-ylbenzene
• CAS: 156184-01-9
• 化学式: C₁₁H₁₄O₂
• 分子量: 178.231
• InChiKey: VEIAFFZSFAYZKE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-isopropenyl-4-(methoxymethoxy)benzene 、 二碘甲烷 在 diethylzinc 作用下， 以 四氢呋喃 、 甲苯 为溶剂， 以94%的产率得到1-(methoxymethoxy)-4-(1-methylcyclopropyl)benzene
  参考文献：
  名称：

  WO2007/120012

  摘要：

  公开号：
• 作为产物：
  描述：

  1-[4-(甲氧基甲氧基)苯基]乙酮 、 甲基三苯基溴化膦 在 正丁基锂 作用下， 以 四氢呋喃 为溶剂， 反应 2.0h， 以75%的产率得到1-isopropenyl-4-(methoxymethoxy)benzene
  参考文献：
  名称：

  WO2007/120012

  摘要：

  公开号：

文献信息

• JPH0632819A
  申请人：——

  公开号：JPH0632819A

  公开（公告）日：1994-02-08
• JPH0665317A
  申请人：——

  公开号：JPH0665317A

  公开（公告）日：1994-03-08
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110065040A1

  公开（公告）日：2011-03-17

  The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R 1 represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., R 2 and R 3 each independently represent a hydrogen atom, etc., R 4 , R 5 and R 6 each independently represent a hydrogen atom, etc., A 1 represents a single bond or a C1-C2 alkylene group in which one or more —CH 2 — can be replaced by —O—.
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：YAMAGUCHI Satoshi

  公开号：US20110171576A1

  公开（公告）日：2011-07-14

  A salt represented by the formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents *—CO—O-L a - or *—CH 2 —O-L b -, * represents a binding position to —C (Q 1 ) (Q 2 )-, L a and L b independently represent a C1-C15 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 represents a C2-C36 nitrogen-containing heterocyclic group in which one or more —CH 2 — can be replaced by —O—, and Z 1⊕ represents an organic counter ion.
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20110200940A1

  公开（公告）日：2011-08-18

  The present invention provides a salt represented by the formula (I): wherein R 1 and R 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X 1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO— and which can have one or more fluorine atoms, R 3 represents a hydrogen atom or a methyl group, and Z 1+ represents an organic counter cation, and a photoresist composition containing the same.