2',3,3',4,4',5-hexamethoxydiphenylcarbinol | 174968-68-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2',3,3',4,4',5-hexamethoxydiphenylcarbinol
• 英文别名: 3,4,5,3',4',5'-hexamethoxybenzhydrol；bis(3,4,5-trimethoxyphenyl)methanol；Hydroxy-bis-(3,4,5-trimethoxy-phenyl)-methan
• CAS: 174968-68-4
• 化学式: C₁₉H₂₄O₇
• 分子量: 364.395
• InChiKey: PIOYJRZMRYBYLG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  26
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  75.6
• 氢给体数：
  1
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  2',3,3',4,4',5-hexamethoxydiphenylcarbinol 在 pyridinium chlorochromate 作用下， 以 二氯甲烷 为溶剂， 反应 24.0h， 以95%的产率得到2',3,3',4,4',5-hexamethoxybenzophenone
  参考文献：
  名称：

  苯并恶唑连接的康维他汀类似物的合成，抗癌评估和分子对接研究

  摘要：

  合成了一系列新颖的苯并恶唑连接的康布雷他汀衍生物（11a – 11n），并通过1 H NMR，13 C NMR和质谱分析证实。筛选合成的化合物（11a – 11n）对三种人类癌细胞系，乳腺癌（MCF-7），肺（A549）和黑色素瘤（A375）的抗癌活性。大多数化合物表现出中等至有效的抗癌活性。在这些化合物中，11g，11h，11l，11m和11n显示出比阳性对照多柔比星更强的活性。此外，化合物11g，分别对11l，11m和11n进行了EGFR受体的分子对接研究（PDB ID：4hjo），结果表明11g和11l与该受体具有很强的结合相互作用。发现结合能的计算与观察到的IC 50值非常一致。

  DOI：

  10.1007/s00044-020-02504-9
• 作为产物：
  描述：

  1,2,3-三甲氧基苯 在 N-溴代丁二酰亚胺(NBS) 、 正丁基锂 作用下， 以 四氢呋喃 、 四氯化碳 为溶剂， 反应 36.5h， 生成 2',3,3',4,4',5-hexamethoxydiphenylcarbinol
  参考文献：
  名称：

  Antineoplastic Agents. 443. Synthesis of the Cancer Cell Growth Inhibitor Hydroxyphenstatin and Its Sodium Diphosphate Prodrug

  摘要：

  A structure-activity relationship (SAR) study of the South African willow tree (Combretum caffrum) antineoplastic constituent combretastatin A-4 (3b) led to the discovery of a potent cancer cell growth inhibitor designated phenstatin (5a). This benzophenone derivative of combretastatin A-4 showed remarkable antineoplastic activity, and the benzophenone derivative of combretastatin A-1 was therefore synthesized. The benzophenone, designated hydroxyphenstatin (6a), was synthesized by coupling of a protected bromobenzene and a benzaldehyde to give the benzhydrol with subsequent oxidation to the ketone. Hydroxyphenstatin was converted to the sodium phosphate prodrug (6e) by a dibenzyl phosphite phosphorylation and subsequent benzyl cleavage (6a --> 6d --> 6e). While hydroxyphenstatin (6a) was a potent inhibitor of tubulin polymerization with activity comparable to that of combretastatin A-1 (3a), the phosphorylated derivative (6e) was inactive.

  DOI：

  10.1021/jm000045a

文献信息

• Synthesis and Biological Evaluation of 1-(Diarylmethyl)-1H-1,2,4-triazoles and 1-(Diarylmethyl)-1H-imidazoles as a Novel Class of Anti-Mitotic Agent for Activity in Breast Cancer
  作者：Gloria Ana、Patrick M. Kelly、Azizah M. Malebari、Sara Noorani、Seema M. Nathwani、Brendan Twamley、Darren Fayne、Niamh M. O’Boyle、Daniela M. Zisterer、Elisangela Flavia Pimentel、Denise Coutinho Endringer、Mary J. Meegan

  DOI：10.3390/ph14020169

  日期：——

  We report the synthesis and biochemical evaluation of compounds that are designed as hybrids of the microtubule targeting benzophenone phenstatin and the aromatase inhibitor letrozole. A preliminary screening in estrogen receptor (ER)-positive MCF-7 breast cancer cells identified 5-((2H-1,2,3-triazol-1-yl)(3,4,5-trimethoxyphenyl)methyl)-2-methoxyphenol 24 as a potent antiproliferative compound with

  我们报告了化合物的合成和生化评估，这些化合物被设计为靶向二苯甲酮芬司他汀和芳香酶抑制剂来曲唑的微管杂合体。对雌激素受体 (ER) 阳性 MCF-7 乳腺癌细胞的初步筛选鉴定出 5-((2 H -1,2,3-三唑-1-基)(3,4,5-三甲氧基苯基)甲基)-2 -甲氧基苯酚24作为一种有效的抗增殖化合物，在 MCF-7 乳腺癌细胞 (ER+/​​PR+) 中的 IC 50值为 52 nM，在三阴性 MDA-MB-231 乳腺癌细胞中的 IC 50 值为 74 nM。这些化合物在 MCF-7 细胞系中表现出显着的 G 2 /M 期细胞周期停滞和诱导细胞凋亡，抑制微管蛋白聚合，并且在非致瘤性 MCF-10A 乳腺细胞中进行评估时对癌细胞具有选择性。 MCF-7 细胞的免疫荧光染色证实，这些化合物靶向微管蛋白并诱导多核，这是有丝分裂灾难的公认标志。微管蛋白秋水仙碱结合位点中化合物19e 、 21l
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
  申请人：TOKYO ELECTRON LIMITED

  公开号：US10025187B2

  公开（公告）日：2018-07-17

  A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).

  根据本发明，一种光敏化学放大型抗蚀剂材料用于两阶段曝光光刻工艺，它包含(1)可显影碱成分和(2)通过曝光产生光敏剂和酸的成分。在由(a)酸-光敏剂发生器、(b)光敏剂前体和(c)光酸发生器组成的三个组件中，上述组件只包含(a)组件、任意两个组件或(a)至(c)的所有组件。
• ON the silylation of diarylcarbinols
  作者：Philippe Gautret、Samira El-ghammarti、Anne Legrand、Daniel Couturier、Beno[icaron]t Rigo

  DOI：10.1080/00397919608086745

  日期：1996.2

  Because of their dismutation into benzophenones and diphenylmethanes, it is necessary to use chlorotrimethylsilane and not triflic acid as a catalyst for the silylation of diarylcarbinol with hexamethyldisilazane.