4,4'-(cyclopentane-1,1-diyl)bis(2,6-dimethylphenol) | 156749-76-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4,4'-(cyclopentane-1,1-diyl)bis(2,6-dimethylphenol)
• 英文别名: Phenol, 4,4'-cyclopentylidenebis[2,6-dimethyl-；4-[1-(4-hydroxy-3,5-dimethylphenyl)cyclopentyl]-2,6-dimethylphenol
• CAS: 156749-76-7
• 化学式: C₂₁H₂₆O₂
• 分子量: 310.436
• InChiKey: NHPARHIYVDSSNU-UHFFFAOYSA-N

物化性质

• 沸点：
  446.7±45.0 °C(Predicted)
• 密度：
  1.118±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  6.3
• 重原子数：
  23
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4,4'-(cyclopentane-1,1-diyl)bis(2,6-dimethylphenol) 、 lead(IV) tetraacetate 以 乙酸乙酯 为溶剂， 反应 0.67h， 以64%的产率得到cyclopentane-1,1-diylbis(1,5-dimethyl-6-oxocyclohexa-2,4-diene-3,1-diyl) diacetate
  参考文献：
  名称：

  芳香族化合物到双三喹烷：双酚的串联氧化脱芳香化作用，环加成，光重排和快速进入Xermphalinone E的碳环骨架

  摘要：

  已经报道了从容易获得的2，6-二甲基苯酚8合成鸟状的双-三奎烷3的新方法，该鸟形的双-三奎烷3是与Xeromphaloneone E 1的骨架紧密相关的迷人的碳环骨架。的双-环己二烯酮合成6，22A - ë由四甲基双酚的氧化乙酰化7，20A - ë已经使用不同的反应条件下，两种不同的试剂的影响。双环己二酮6的环加成反应生成两个碳环，双加合物4b和单加合物5d以立体声控制的方式。在光化学σ迁移1,2-酰基移4B布置3和monotriquinane 9与9乙酸基-9-甲基-联内三环[5,2,2,0 2,6 ]十一碳-4,10-二烯8合一系统。通过环己二烯酮环的芳构化，在单加合物5d的oxa-di-π-甲烷（ODPM）重排过程中，还分离出了两种不同的五取代苯酚13和14。的双-环己二烯酮的光化学行为6，22A - ë 还已经在紫外线辐射下进行了研究，并且通过迁移和消除乙酸酯基团为每个双环己二酮分离了两种不同的芳构化产物。

  DOI：

  10.1016/j.tet.2014.05.020
• 作为产物：
  描述：

  2,6-二甲基苯酚 、 环戊酮 在 silica supported perchloric acid 作用下， 以 neat (no solvent) 为溶剂， 反应 4.75h， 以86%的产率得到4,4'-(cyclopentane-1,1-diyl)bis(2,6-dimethylphenol)
  参考文献：
  名称：

  高氯酸-二氧化硅催化烷基和芳基双酚的环保无溶剂路线

  摘要：

  双酚类通常由酚类与羰基化合物缩合形成，已发现多种有用的应用。1-7 文献记录了多种合成双酚的方法，...

  DOI：

  10.1080/00304948.2020.1762459

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• (METH)ACRYLIC RESIN COMPOSITION, FILM, POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160376462A1

  公开（公告）日：2016-12-29

  There is provided a (meth)acrylic resin composition containing a (meth)acrylic resin, and a compound denoted by General Formula (1) described below, a film formed by using the (meth)acrylic resin composition, and a polarizing plate and a liquid crystal display device including the film: wherein R 1 to R 8 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, or a hydrocarbon group having 1 to 12 carbon atoms, X represents a divalent alicyclic group having 4 to 20 carbon atoms, the alicyclic group represented by X may have at least one substituent group selected from a halogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, and an aromatic hydrocarbon group having 6 to 15 carbon atoms.

  提供了一种（甲基）丙烯酸树脂组合物，包含（甲基）丙烯酸树脂和下述通式（1）所表示的化合物，使用（甲基）丙烯酸树脂组合物形成的膜，以及包括该膜的偏光板和液晶显示装置：其中，R1至R8分别独立地表示氢原子、卤素原子、羟基或具有1至12个碳原子的碳氢基团，X表示具有4至20个碳原子的二价脂环基团，由X表示的脂环基团可以具有至少一种取代基，所述取代基选自卤素原子、具有1至12个碳原子的脂肪族碳氢基团和具有6至15个碳原子的芳香族碳氢基团。
• Curable resin composition
  申请人：Kawabe Masanao

  公开号：US20070129502A1

  公开（公告）日：2007-06-07

  Provided is curable resin composition which gives a cured article excellent in chemical resistance, dielectric properties, low water-absorption, heat resistance, flame retardance, and mechanical properties and which is usable in applications such as dielectric materials, insulating materials, heat-resistant materials, and structural materials. The curable resin composition includes a component (A) which is a polyphenylene ether oligomer having a number-average molecular weight of 700 to 4,000 and having a vinyl group at both end and a component (B) which is a solvent-soluble polyfunctional vinylaromatic copolymer which has structural units derived from monomers including a divinylaromatic compound (a) and an ethylvinylaromatic compound (b) and in which the content of repeating units derived from the divinylaromatic compound (a) is 20 mol % or higher, the ratio of the amount (wt. %) of the component (A) to that (wt. %) of the component (B) being (20 to 98):(2 to 80). The composition can further contain a layered silicate, a halogenated flame retardant, etc.

  提供了一种可治愈的树脂组合物，其使得固化后的制品具有出色的化学耐性、介电性能、低吸水性、耐热性、阻燃性和机械性能，并可用于介电材料、绝缘材料、耐热材料和结构材料等应用。该可治愈的树脂组合物包括以下组分：(A)是一种聚苯醚寡聚体，其具有700至4,000的数量平均分子量，并在两端具有乙烯基；(B)是一种可溶于溶剂的多功能乙烯基芳香族共聚物，其具有从单体中衍生出的结构单元，包括一种二乙烯基芳香族化合物(a)和一种乙基乙烯基芳香族化合物(b)，其中重复单元中来自二乙烯基芳香族化合物(a)的含量为20摩尔%或更高，组分(A)与组分(B)的重量比为(20至98)∶(2至80)。该组合物还可以进一步包含层状硅酸盐、卤素阻燃剂等。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• THERMOPLASTIC FILM, THERMOPLASTIC RESIN COMPOSITION, AND PHYLLOSILICATE
  申请人：TEIJIN LIMITED

  公开号：EP1538183A1

  公开（公告）日：2005-06-08

  There is provided a film comprising a layered silicate cation-exchanged with an organic cation and a polyester or polycarbonate. The organic cation is represented by the following formula (I): wherein R is a group represented by the following formula (I-1): wherein R1 is a divalent hydrocarbon group having 5 to 20 carbon atoms, and R2 is a divalent hydrocarbon group having 1 to 20 carbon atoms, an alkyl group, an aryl group or an aralkyl group, L+ is an ammonium ion, a phosphonium ion or a hetero aromatic ion, and n is an integer of 1 to 4, with the proviso that when L+ is an ammonium ion or a phosphonium ion, n is 4 and four Rs may be the same or different. This film has the layered silicate highly dispersed therein and is excellent in various properties such as mechanical properties and dimensional stability.

  本发明提供了一种薄膜，它由与有机阳离子进行阳离子交换的层状硅酸盐和聚酯或聚碳酸酯组成。有机阳离子由下式（I）表示： 其中 R 是由下式（I-1）表示的基团： 其中 R1 是具有 5 至 20 个碳原子的二价烃基，R2 是具有 1 至 20 个碳原子的二价烃基、 L+ 是铵离子、鏻离子或杂芳离子，n 是 1 至 4 的整数，但当 L+ 是铵离子或鏻离子时，n 是 4，四个 R 可以相同或不同。这种薄膜具有高度分散的层状硅酸盐，在机械性能和尺寸稳定性等各种性能方面都非常出色。