Provide is a polar compound having high chemical stability, high capability of aligning liquid crystal molecules, high solubility in a liquid crystal composition, and a large voltage holding ratio when the compound is used in a liquid crystal display device. A compound represented by formula (1) is applied.
For example, in formula (1), P
1
is any one of formulas (1b) to (1i), Sp is a single bond, Z is —COO—, and A is 1,4-phenylene.
New selective syntheses of (meth)acrylic monomers: Isocyanates, isocyanurates, carbamates and ureas derivatives
作者:Christine Dubosclard-Gottardi、Paul Caubère、Yves Fort
DOI:10.1016/0040-4020(95)00005-s
日期:1995.2
conveniently obtained by simple condensation of potassium cyanate with ω-halogeno-alkyl (meth)acrylates under appropriated phase transfer catalytic conditions. Depending on the reaction media and the temperature, these isocyanate derivatives may be isolated, trimerized to the corresponding isocyanurates or trapped in situ as carbamates or ureas compounds.
Copolymer and photoresist composition including the same
申请人:Choi Sang-Jun
公开号:US20100233620A1
公开(公告)日:2010-09-16
A resist copolymer includes a repeating unit having the following Chemical Formula 1, a repeating unit having the following Chemical Formula 2, and a repeating unit having the following Chemical Formula 3:
NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME
申请人:TOSOH CORPORATION
公开号:EP1889857A1
公开(公告)日:2008-02-20
To provide a medium suitable for high speed/high resolution, rich in hydrophilicity and resistant to a high concentration aqueous alkaline solution.
A medium comprising crosslinked polymer particles containing from 20 to 95 mol% of repeating units derived from a (meth)acryloyl monomer represented by the formula (1) :
wherein R2 is a hydrogen atom or a C1-4 alkyl group, R1 is -NR3-R4-R5 or -O-R4-R5, R3 is a hydrogen atom or a C1-4 alkyl group, R4 is a C6-15 alkylene group containing an alicyclic ring or a C4-8 linear alkylene group, and R5 is a halogen atom, an alcoholic OH group, an amino group, a glycidyl group or an epoxy group.
The present invention relates to a radiation curable composition. In particular, the present invention relates to a radiation curable composition with hydrophilic nanoparticles for use in barrier stacks for protection of sensitive devices against moisture.