POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
申请人:Utsumi Yoshiyuki
公开号:US20130022911A1
公开(公告)日:2013-01-24
A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO
2
-containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO
2
NH
2
and —CONH
2
and a structural unit (a5) which generates acid upon exposure.
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND
申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US20130177854A1
公开(公告)日:2013-07-11
A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R
1
represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X
1
represents divalent linking group; X
2
represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q
1
and Q
2
represents F or fluorinated alkyl group; and W
+
represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H
2
N
+
(X
2
)—X
1
—Y—O-A-C(Q
1
)(Q
2
)—SO
3
−
generated by decomposition upon exposure].