A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.
一种产生光酸的光刻胶组合物,使用芳香族、多环、杂环含氮敏化剂(最好是环状延伸的
吩噻嗪衍
生物)进行敏化。使用增感剂可以使光刻胶暴露在近紫外线辐照下,而此前此类光刻胶只能暴露在深紫外线辐照下。本发明尤其适用于酸性硬化光刻胶体系。