2,4,6-trimethylphenyldiphenylsulfonium mesylate | 470701-56-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,4,6-trimethylphenyldiphenylsulfonium mesylate
• 英文别名: diphenyl-(2,4,6-trimethylphenyl)sulfanium;methanesulfonate
• CAS: 470701-56-5
• 化学式: CH₃O₃S*C₂₁H₂₁S
• 分子量: 400.563
• InChiKey: IBDSYHHWZSNWLG-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.87
• 重原子数：
  27
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2,4,6-trimethylphenyldiphenylsulfonium mesylate 、 sodium bis-(perfluorobutanesulfonyl)imide 以 水 、 乙酸乙酯 为溶剂， 反应 24.0h， 生成 2,4,6-trimethylphenyldiphenylsulfonium bis-(perfluorobutanesulfonyl)imide
  参考文献：
  名称：

  [EN] PHOTOSENSITIVE COMPOSITIONS
  [FR] COMPOSITIONS PHOTOSENSIBLES

  摘要：

  公开号：

  WO2004002955A3
• 作为产物：
  描述：

  均三甲苯 、 二苯基亚砜 、 Eaton reagent 在 甲苯 、 aqueous solution 、 四甲基氢氧化铵 作用下， 以 水 为溶剂， 反应 5.5h， 生成 2,4,6-trimethylphenyldiphenylsulfonium mesylate
  参考文献：
  名称：

  Photoacid generators for use in photoresist compositions

  摘要：

  具有以下一般结构的光酸化合物：R—O（CF2）nSO3X，其中n为约1至4之间的整数；R选自以下组合：取代或未取代的C1-C12直链或支链烷基或烯基，取代或未取代的araalkyl，取代或未取代的芳基，取代或未取代的双环烷基，取代或未取代的三环烷基，氢，烷基磺酸，取代或未取代的部分氟化烷基，一般结构F（（CF2）pO）m（CF2）q—，其中p在约1至4之间，m在约0至3之间，q在约1至4之间，以及取代或未取代的部分氟化烷基，卤氟烷基，全氟烷基磺酸或环氧丙基；X选自以下组合：有机阳离子和共价键结合的有机自由基。

  公开号：

  US06855476B2

文献信息

• Photoresist compositions
  申请人：Arch Speciality Chemical, Inc.

  公开号：US20040072095A1

  公开（公告）日：2004-04-15

  Radiation sensitive compositions for use in producing a patterned image on a substrate comprise: e) a first photoacid generator (PAG) compound P1, which comprises one or more compounds of the structure (A); f) a second photoacid generator compound P2 which comprises one or more compounds of the structure (B); and g) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); and h) a solvent 1 where R 1 and R 2 are each independently C 1 -C 12 fluoroalkyl groups or together R 1 and R 2 are joined with the N to form a (F 2 C) y N ring where y=4-12; R 3 , R 4 , and R 5 are each independently selected from unsubstituted aryl, alkyl or alpha-ketomethyl groups and such groups substituted with an acid sensitive group, or R 3 and R 4 together with the S atom form a cycloalkylsulfonium ring; R 6 to R 11 and R 6′ to-R 11′ are each independently selected from branched or linear alkyl, alkoxy, halogen, hydrogen, OCO 2 G, OCH 2 CO 2 G, or OG where G=an acid sensitive group; 2 where each R 12 is independently selected from a linear, cyclic, or branched C 1 -C 8 fluoroalkyl group, substituted or unsubstituted phenyl group, substituted or unsubstituted naphthalene group, C 6 -C 12 cyclic or alicyclic hydrocarbon, or a linear, cyclic, or branched C 1 -C 8 alkyl group; 3 wherein R 13 is selected from H, C 1 -C 4 lower alkyl, CN, or CH 2 CO 2 R 20 ; R 14 and R 15 are each independently selected from H, linear or branched C 1 -C 4 alkyl, or halogen; R 16 is H, or branched or linear C 1 -C 4 alkyl; R 17 is selected from substituted or unsubstituted phenyl, a substituted or unsubstituted linear, branched or cyclic C 1 -C 20 alkyl, optionally containing an ether or ester group, a substituted or unsubstituted phenylalkylene or a substituted or unsubstituted C 6 -C 20 cyclic alkylene; R 18 and R 19 are independently selected from H, linear or branched or cyclic C 1 -C 14 alkyl, or C 7 -C 14 alicyclic; R 20 is selected from a C 1 -C 14 branched linear or cyclic alkyl, substituted or unsubstituted phenyl, or C 7 -C 14 alicyclic group.

  用于在衬底上产生图案化图像的辐射敏感组分包括：e）第一种光酸发生剂（PAG）化合物P1，其包括一个或多个结构（A）的化合物；f）第二种光酸发生剂化合物P2，其包括一个或多个结构（B）的化合物；和g）聚合物组分，其包括一种碱溶性树脂组分，其碱溶性受到酸敏感基团的存在抑制，并且通过处理酸和（可选）热来恢复其碱溶性；其中所述聚合物包括一个或多个包含单体单元（C）的聚合物；和h）溶剂1，其中R1和R2分别是C1-C12氟烷基，或者R1和R2一起与N结合形成（F2C）yN环，其中y=4-12；R3、R4和R5各自独立地选自未取代的芳基、烷基或α-酮甲基基团以及带有酸敏感基团的这样的基团，或者R3和R4与S原子一起形成环状烷基磺鎓环；R6到R11和R6'到R11'各自独立地选自分支或线性烷基、烷氧基、卤素、氢、OCO2G、OCH2CO2G或OG，其中G=酸敏感基团；2其中每个R12独立地选自线性、环状或分支的C1-C8氟烷基，取代或未取代的苯基，取代或未取代的萘基，C6-C12环状或脂环烃，或线性、环状或分支的C1-C8烷基；3其中R13选自H、C1-C4低烷基、CN或CH2CO2R20；R14和R15各自独立地选自H、线性或分支的C1-C4烷基或卤素；R16选自H，或分支或线性的C1-C4烷基；R17选自取代或未取代的苯基、取代或未取代的线性、分支或环状C1-C20烷基，可选地含有醚或酯基团，取代或未取代的苯基烷基或取代或未取代的C6-C20环状烷基；R18和R19独立地选自H、线性或分支的C1-C14烷基或C7-C14脂环烃；R20选自C1-C14分支线性或环状烷基、取代或未取代的苯基或C7-C14脂环烃基团。
• EP1299774A4
  申请人：——

  公开号：EP1299774A4

  公开（公告）日：2005-06-08
• PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS
  申请人：Arch Specialty Chemicals, Inc.

  公开号：EP1299774A1

  公开（公告）日：2003-04-09
• US6855476B2
  申请人：——

  公开号：US6855476B2

  公开（公告）日：2005-02-15
• [EN] PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS<br/>[FR] GENERATEURS PHOTOACIDES A UTILISER DANS DES COMPOSITIONS DE PHOTORESINE
  申请人：ARCH SPEC CHEM INC

  公开号：WO2002082185A1

  公开（公告）日：2002-10-17

  A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.