4-ethylphenyl phenyl sulfide | 19164-74-0

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 4-ethylphenyl phenyl sulfide
• 英文别名: 1-Ethyl-4-phenylsulfanylbenzene
• CAS: 19164-74-0
• 化学式: C₁₄H₁₄S
• 分子量: 214.331
• InChiKey: UPUXPOINDKAPHP-UHFFFAOYSA-N

物化性质

• 沸点：
  123-124 °C(Press: 0.05 Torr)
• 密度：
  1.08±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  4-ethylphenyl phenyl sulfide 在 过氧乙酸 作用下， 以 溶剂黄146 为溶剂， 生成 1-benzenesulfonyl-4-ethylbenzene
  参考文献：
  名称：

  Horner,L. et al., Justus Liebigs Annalen der Chemie, 1968, vol. 714, p. 91 - 111

  摘要：

  DOI：
• 作为产物：
  描述：

  碘苯 、 4-乙基苯硫酚 在 [1,3-bis(2,6-diisopropylphenyl)imidazol-2-ylidene](3chloro-pyridyl)palladium(II) dichloride 、 potassium tert-butylate 、 锌 作用下， 反应 3.0h， 以89%的产率得到4-ethylphenyl phenyl sulfide
  参考文献：
  名称：

  通过球磨实现了鲁棒的Pd催化的CS交叉耦合工艺。

  摘要：

  已经开发出了一种操作简单的芳基卤化物与硫醇的机械化学化学偶联方法。该反应过程在台式条件下进行，不需要（干燥）溶剂，惰性气氛或催化剂预活化。反应在3小时内完成。该反应已在多种底物上得到证实。已经发现，在某些情况下，尤其是对于烷基硫醇的偶联，锌金属的加入是至关重要的。

  DOI：

  10.1021/acs.orglett.0c02418

文献信息

• Copper oxide nanoparticles catalyzed synthesis of aryl sulfides via cascade reaction of aryl halides with thiourea
  作者：K. Harsha Vardhan Reddy、V. Prakash Reddy、J. Shankar、B. Madhav、B.S.P. Anil Kumar、Y.V.D. Nageswar

  DOI：10.1016/j.tetlet.2011.03.070

  日期：2011.5

  and highly efficient protocol for the synthesis of symmetrical aryl sulfides was developed by the cross-coupling of aromatic halides with inexpensive and commercially available thiourea which was used as an effective sulfur surrogate. The present cross-coupling protocol of thiourea, via cascade reaction with various substituted aryl halides, producing desired aryl sulfides, has an added advantage of

  通过芳族卤化物与廉价和可商购的硫脲的交叉偶联，开发出可循环的氧化铜纳米颗粒催化简单而高效的合成对称芳基硫醚的方法，该硫脲被用作有效的硫代用品。通过与各种取代的芳基卤化物的级联反应，产生所需的芳基硫醚，本发明的硫脲的交叉偶联方案具有避免臭味的硫醇的附加优点。
• BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS
  申请人：Kori Daisuke

  公开号：US20120252218A1

  公开（公告）日：2012-10-04

  A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.

  提供公式（1）的二苯基衍生物，其中Ar1和Ar2表示苯环或萘环，x和z各自为0或1。含有该二苯基衍生物的材料或含有该二苯基衍生物重复单元的聚合物被旋涂并经热处理，以形成具有改进性能、最佳值的n和k、阶梯覆盖、蚀刻抗性、耐热性、耐溶剂性和最小化气体放出的抗蚀底层。
• ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160336189A1

  公开（公告）日：2016-11-17

  An organic film composition including a compound represented by the following general formula (1), wherein n1 and n2 each independently represent 0 or 1; “W” represents a single bond or any of structures represented by the following formula (2); R 1 represents any of structures represented by the following general formula (3); m1 and m2 each independently represent an integer of 0 to 7, with the proviso that m1+m2 is 1 to 14. There can be provided an organic film composition for forming an organic film having dry etching resistance as well as advanced filling/planarizing characteristics.

  一种有机薄膜组合物，包括以下通式（1）所表示的化合物，其中n1和n2各自独立地表示0或1；“W”表示单键或以下式（2）所表示的任何结构之一；R1表示以下通式（3）所表示的任何结构之一；m1和m2各自独立地表示0到7的整数，但m1+m2为1到14。可以提供一种有机薄膜组合物，用于形成具有干法蚀刻抗性以及先进的填充/平坦化特性的有机薄膜。
• RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20130087529A1

  公开（公告）日：2013-04-11

  There is disclosed A resist underlayer film composition, the resist underlayer film composition contains a truxene compound having a substituted or an unsubstituted naphthol group as shown by the following general formula (1). There can be provided a resist underlayer film composition to form a resist underlayer film being capable of reducing reflectance and having high etching resistance, heat resistance.

  公开了一种抗蚀底层膜组合物，该抗蚀底层膜组合物包含一种三苯乙烷化合物，其具有如下通式（1）所示的取代或未取代萘酚基。可以提供一种抗蚀底层膜组合物，以形成一种能够减少反射并具有高蚀刻抗性和耐热性的抗蚀底层膜。
• BLOCK POLYMER HAVING FUNCTIONAL GROUPS AT BOTH ENDS
  申请人：Kataoka, Kazunori

  公开号：EP0844269A1

  公开（公告）日：1998-05-27

  The present invention provides a block polymer which has functional groups on its both ends, and which comprises hydrophilic/hydrophobic segments. As for the functional groups on its both ends, the block polymer has amino group, carboxyl group or mercapto group on α-terminal, and hydroxyl group, carboxyl group, aldehyde group or vinyl group on ω-terminal. Hydrophilic segment comprises polyethylene oxide, while hydrophobic segment is derived from lactide, lactone or (meth)acrylic acid ester. The block polymer of this invention forms a polymeric micelle which is usable as bio-compatible materials.

  本发明提供了一种嵌段聚合物，它的两端都带有官能团，并包括亲水/疏水段。至于两端的官能团，嵌段聚合物的α-端有氨基、羧基或巯基，ω-端有羟基、羧基、醛基或乙烯基。亲水段包括聚环氧乙烷，而疏水段来自内酯、内酯或（甲基）丙烯酸酯。本发明的嵌段聚合物形成的聚合物胶束可用作生物兼容材料。