2-(4-hydroxybenzoyloxy)ethyl methacrylate | 34573-66-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-(4-hydroxybenzoyloxy)ethyl methacrylate
• 英文别名: 2-(2-methylacryloyloxy)ethyl 4-hydroxybenzoate；2-[(2-Methylacryloyl)oxy]ethyl 4-hydroxybenzoate；2-(2-methylprop-2-enoyloxy)ethyl 4-hydroxybenzoate
• CAS: 34573-66-5
• 化学式: C₁₃H₁₄O₅
• 分子量: 250.251
• InChiKey: NYFYPLLPDFAFFX-UHFFFAOYSA-N

物化性质

• 沸点：
  404.6±25.0 °C(Predicted)
• 密度：
  1.210±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  18
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  72.8
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  丁酸酐 、 2-(4-hydroxybenzoyloxy)ethyl methacrylate 在 三乙胺 作用下， 以 二氯甲烷 为溶剂， 以92%的产率得到2-(4-butanoyloxybenzoyloxy)ethyl methacrylate
  参考文献：
  名称：

  [EN] POLYMER MATERIALS FOR DELIVERY OF SHORT-CHAIN FATTY ACIDS TO THE INTESTINE FOR APPLICATIONS IN HUMAN HEALTH AND TREATMENT OF DISEASE
  [FR] MATIÈRES POLYMÈRES POUR L'ADMINISTRATION D'ACIDES GRAS À CHAÎNE COURTE À L'INTESTIN POUR DES APPLICATIONS DE SANTÉ HUMAINE ET DE TRAITEMENT DE MALADIE

  摘要：

  本文提供了一些聚合物材料，例如用于传递短链脂肪酸。具体来说，提供了形成稳定纳米级结构并释放其有效载荷的聚合物，例如通过共价键的断裂（例如通过水解或酶解）。这些聚合物可用于将有效载荷（例如SCFAs）传递到肠道，用于健康和治疗疾病的应用，并在与人类微生物群落变化相关的疾病中具有广泛适用性，包括炎症性、自身免疫、过敏、代谢和中枢神经系统疾病等。

  公开号：

  WO2018195067A1
• 作为产物：
  描述：

  2-(4-ethoxycarbonyloxybenzoyloxy)ethyl methacrylate 在 吡啶 、 氨 作用下， 以 氯仿 、 水 、 丙酮 为溶剂， 以60%的产率得到2-(4-hydroxybenzoyloxy)ethyl methacrylate
  参考文献：
  名称：

  PARABEN DERIVATIVES FOR PRESERVING CELLULOSIC MATERIALS

  摘要：

  提供了一种保存纤维素材料的方法。该方法包括将纤维素材料与含对羟基苯甲酸酯单体接触，并聚合含有对羟基苯甲酸酯单体的聚合物。还提供了包括纤维素材料和至少一种包含对羟基苯甲酸酯基团的聚合物的制品。

  公开号：

  US20130004785A1

文献信息

• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS
  申请人：YONEZAWA Hiroyuki

  公开号：US20120107563A1

  公开（公告）日：2012-05-03

  There is provided a method for producing a pattern, and the method includes forming a film by removing the solvent from a photosensitive resin composition containing (Component A) a polymer including a monomer unit (a1) having a residue of a carboxyl group or a phenolic hydroxyl group protected with an acid-decomposable group, and a monomer unit (a2) having an epoxy group and/or an oxetanyl group; (Component B) a photo acid generator; and (Component C) a solvent; exposing the film patternwise to an active radiation; developing the exposed film with an aqueous developer liquid to form a pattern; and baking the pattern by heating.

  提供了一种生产图案的方法，该方法包括通过从含有（组分A）聚合物的光敏树脂组成的溶剂中去除溶剂形成薄膜，其中聚合物包括具有羧基残基或酚羟基残基的单体单位（a1）和酸分解性基团保护的单体单位（a2）具有环氧基团和/或氧杂环基团；（组分B）光酸发生剂；以及（组分C）溶剂；将薄膜以图案方式暴露于活性辐射下；用水性显影液显影暴露的薄膜以形成图案；并通过加热烘烤图案。
• Photopolymerizable composition and recording material
  申请人：Fuji Photo Film Co., Ltd.

  公开号：EP1298490A2

  公开（公告）日：2003-04-02

  The present invention provides a photopolymerizable composition containing a polymerizable compound having an ethylenically unsaturated bond, a compound represented by the following general formula (I), and a radical generating agent capable of generating a radical by interacting with the compound represented by the following general formula (I). General Formula (I); In the general formula (I), R1, R2, and R3 each individually represent a hydrogen atom or a monovalent substituent; R4 represents at least one member selected from the group consisting of: a hydrogen atom, an aliphatic group, an aromatic group, and a heterocyclic group; Z1 represents a substituent necessary for allowing the compound represented by the general formula (I) to become a dye; and X- represents a group capable of forming an anion. The invention also provides a recording material in which a recording layer containing the photopolymerizable composition is provided on a support.

  本发明提供了一种可光聚合组合物，该组合物含有一种具有乙烯不饱和键的可聚合化合物、一种由以下通式(I)表示的化合物，以及一种能够通过与以下通式(I)表示的化合物相互作用而生成自由基的自由基生成剂。通式（I）； 在通式（I）中，R1、R2 和 R3 分别代表氢原子或一价取代基；R4 代表至少一个选自氢原子、脂肪族基团、芳香族基团和杂环基团的成员；Z1 代表使通式（I）所代表的化合物成为染料所必需的取代基；X- 代表能够形成阴离子的基团。本发明还提供了一种记录材料，在该记录材料中，含有可光聚合组合物的记录层被设置在支持物上。
• Cyanine-based organic dyes, photopolymerizable compositions, and recording materials
  申请人：——

  公开号：US20020051926A1

  公开（公告）日：2002-05-02

  A novel cyanine-based dye, a photopolymerizable composition having high sensitivity not only to ultraviolet light but also to visible-to-infrared light, and a recording material which is excellent in sensitivity and decolorization in background and which can form sharp, high-contrast images. The cyanine-based dye is an organic dye represented by the following general formula (3). The photopolymerizable composition contains a polymerizable compound having an ethylenically unsaturated bond, a compound represented by the following general formula (1), and a radical generator capable of generating a radical by interacting with that compound: 1

  一种新颖的氰基染料，一种不仅对紫外线而且对可见光到红外线都具有高灵敏度的可光聚合组合物，以及一种在灵敏度和背景脱色方面都很出色并能形成清晰、高对比度图像的记录材料。氰基染料是由以下通式（3）表示的有机染料。可光聚合组合物包含一种具有乙烯不饱和键的可聚合化合物、一种由下式通式（1）表示的化合物和一种能通过与该化合物相互作用产生自由基的自由基发生器： 1
• Photopolymerizable composition and photosensitive thermal recording material
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20020168494A1

  公开（公告）日：2002-11-14

  The invention discloses a photopolymerizable composition comprising at least one, ethylenic unsaturated bond-containing compound, a hexaaryl-biimidazole compound, and an organoboron compound represented by a specific general formula; and discloses a photosensitive thermal recording material having a recording layer that contains the photopolymerizable composition. The photopolymerizable composition and the photosensitive thermal recording material of the invention are highly sensitive to UV rays and visible to IR rays falling within a wavelength range that includes wavelengths not longer than 450 nm, and are effective for decoloring a dye component that absorbs the rays falling within the wavelength range.

  本发明公开了一种可光聚合组合物，该组合物包含至少一种含乙烯基不饱和键的化合物、六芳基咪唑化合物和由特定通式表示的有机硼化合物；本发明还公开了一种光敏热敏记录材料，该材料具有包含该可光聚合组合物的记录层。本发明的可光聚合组合物和光敏热敏记录材料对波长范围内的紫外线和可见红外线高度敏感，该波长范围包括波长不超过 450 纳米的紫外线和可见红外线，并能有效地使吸收波长范围内光线的染料成分脱色。