ammonium oenanthate | 34322-10-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: ammonium oenanthate
• 英文别名: azane;heptanoic acid
• CAS: 34322-10-6
• 化学式: C₇H₁₃O₂*H₄N
• 分子量: 147.217
• InChiKey: KIWJQNYCQJZQLX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.08
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  41.1
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  ammonium oenanthate 在 octanedioic acid ; neutral ammonium salt 作用下， 19.9 ℃ 、7999.96 MPa 条件下， 以6.0%的产率得到庚酰胺
  参考文献：
  名称：

  Study of the reactivity of ammonium carboxylates in the synthesis of amides under high-pressure deformation conditions

  摘要：

  DOI：

  10.1007/bf00962116

文献信息

• AMINOHETEROARYL COMPOUNDS AS MTH1 INHIBITORS
  申请人：CeMM - Forschungszentrum für Molekulare Medizin GmbH

  公开号：US20160015702A1

  公开（公告）日：2016-01-21

  The present invention relates to an (S)-enantiomer of an aminoheteroaryl compound for use in treating and/or preventing cancer in a subject. The invention further relates to a pharmaceutical composition comprising said compound. Another aspect of the invention is directed to an in vitro method for determining the effectiveness of said (S)-enantiomer of an aminoheteroaryl compound, or said pharmaceutical composition, the method comprising the steps of: (a) obtaining a cell or tissue sample from a subject; and (b) determining the subject's NUDT1/MTH1-status; wherein a NUDT1/MTH1-positive cell or tissue sample is indicative of an effective treatment and/or prevention of cancer. In addition, provided herein is a screening method for identifying a target of an (S)-enantiomer of an aminoheteroaryl compound. Furthermore, in context of this invention, the herein described compounds inhibit the biological activity of MTH1.

  本发明涉及一种氨基杂环化合物的(S)-对映体，用于治疗和/或预防受体内癌症。本发明还涉及一种含有该化合物的药物组合物。本发明的另一个方面涉及一种体外方法，用于确定该氨基杂环化合物的(S)-对映体或该药物组合物的有效性，该方法包括以下步骤：(a)从受体中获取细胞或组织样本；(b)确定受体的NUDT1/MTH1状态；其中，NUDT1/MTH1阳性的细胞或组织样本表明癌症治疗和/或预防有效。此外，本文还提供了一种筛选方法，用于识别(S)-氨基杂环化合物的靶标。此外，在本发明的背景下，所述化合物抑制MTH1的生物活性。
• Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP0827188A2

  公开（公告）日：1998-03-04

  There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

  本发明公开了一种用于生产半导体器件的清洗液，其包括(A)含氟化合物；(B)水溶性或水混溶性有机溶剂；以及(C)无机酸和/或有机酸，可选地，还包括(D)季铵盐或(D')特定有机羧酸铵盐和/或有机羧酸胺盐；以及一种半导体器件的生产工艺，在表面装有绝缘膜层或金属导电层的基片上形成抗蚀图案，通过干法蚀刻形成通孔或电线，通过氧等离子体灰化处理去除抗蚀图案，并用上述清洗液进行清洗处理。上述清洗液和生产工艺可轻松去除干法蚀刻时形成的沉积聚合物，而不会损害金属膜和绝缘膜。
• Photosensitive composition and method for forming pattern using the same
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP1612602A2

  公开（公告）日：2006-01-04

  A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

  本发明提供了一种可用于集成电路等半导体的制造步骤、液晶和热敏头等电路板的制造以及其他制造步骤，并具有出色的分辨率和线边粗糙度的正向工作光敏组合物，以及使用该组合物形成图案的方法，该组合物是一种光敏组合物，其中含有(A)具有特定基团的重复单元的树脂，其在碱性显影剂中的溶解度在酸的作用下会增加，以及使用该组合物形成图案的方法。
• RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE
  申请人：Hitachi Chemical Company, Ltd.

  公开号：EP1672426A1

  公开（公告）日：2006-06-21

  The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent.

  本发明提供了一种辐射固化组合物，该组合物包括（a）：硅氧烷树脂；（b）：光酸发生器或光碱发生器；以及（c）：能够溶解（a）组分并含有壬烷溶剂的溶剂。
• FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART
  申请人：Hitachi Chemical Co., Ltd.

  公开号：EP1829945A1

  公开（公告）日：2007-09-05

  The coating film of the invention is obtained by curing an applied film formed by application of a composition containing an organic solvent with a boiling point of 80°C or higher, wherein the shrinkage ratio of the film thickness from the applied film immediately after application is no greater than 27%.

  本发明的涂膜是通过固化由含有沸点为 80°C 或更高的有机溶剂的组合物形成的涂膜而获得的，其中涂膜厚度与涂膜刚涂抹后的收缩率不大于 27%。