申请人:Hitachi Chemical DuPont MicroSystems Ltd.
公开号:US20020037991A1
公开(公告)日:2002-03-28
A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to
1
-line, developed and heated to form a polyimide relief pattern.
1
wherein Y is a divalent organic group, R
7
and R
8
are OH or a monovalent organic group, R
9
and R
10
are a monovalent hydrocarbon group, R
11
, R
12
and R
13
are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
制备了一种6,6'-二烷基-3,3',4,4'-联苯四羧酐,方法为在4-烷基邻苯二甲酸酐的5位进行溴化反应,然后在镍催化剂存在下耦合溴化产物;将含有通式(7)重复单元的聚酰亚胺前驱体的光敏树脂组合物涂覆在基板上,暴露于1线,经显影和加热形成聚酰亚胺浮雕图案。其中,Y是双价有机基团,R7和R8是OH或单价有机基团,R9和R10是单价碳氢基团,R11、R12和R13是单价碳氢基团,a和b为0到2的整数,c为0到4的整数,m为0到3的整数。